SCHEMBL2038149

SCHEMBL2038149

CCCCCCCCOc1ccccc1-c1ccccc1I

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.49
NR1I2 O75469 1/20 0.49
LMNA P02545 1/20 0.49
CHRM2 P08172 1/20 0.49
CYP3A4 P08684 1/20 0.49
ADRA2A P08913 1/20 0.49
MAPT P10636 1/20 0.49
OPRK1 P41145 1/20 0.49
HTR2B P41595 1/20 0.49
SLC6A3 Q01959 1/20 0.49
KMT2A Q03164 1/20 0.49
HDAC6 Q9UBN7 1/20 0.49
PDE5A O76074 4/20 0.48
PDE4A P27815 3/20 0.48
PDE4B Q07343 3/20 0.48
PDE4C Q08493 3/20 0.48
PDE4D Q08499 3/20 0.48
CYP1A2 P05177 2/20 0.47
CYP2C9 P11712 2/20 0.47
CYP2C19 P33261 2/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8384530 1.00 MEN1 (0.49) MEN1NR1I2LMNACHRM2CYP3A4
SCHEMBL8382149 1.00 MEN1 (0.49) MEN1NR1I2LMNACHRM2CYP3A4
SCHEMBL1598554 0.93 CYP1A2 (0.53) MEN1NR1I2LMNACHRM2CYP3A4
SCHEMBL16582005 0.89 MEN1 (0.57) MEN1NR1I2LMNACHRM2CYP3A4
SCHEMBL5930195 0.86 LMNA (0.54) MEN1NR1I2LMNACHRM2CYP3A4
SCHEMBL4660995 0.86 LMNA (0.54) MEN1NR1I2LMNACHRM2CYP3A4
Trifluoromethanesulfonic Acid SCHEMBL8736420 0.85 PTGDR2 (0.45) MEN1NR1I2LMNACHRM2CYP3A4
SCHEMBL9598552 0.84 CYP1A2 (0.53) MEN1NR1I2LMNACHRM2CYP3A4
Perflubutane SCHEMBL3873217 0.83 PTGDR2 (0.43) MEN1NR1I2LMNACHRM2CYP3A4
SCHEMBL9347920 0.83 S1PR3 (0.47) MEN1NR1I2LMNACHRM2CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6969576-B2 Photosensitive dissolution inhibitors and resists based on onium salt carboxylates SANDIA NATIONAL LABORATORIES (US) 2005-11-29 US claimed
US-8698320-B2 Curable resin compositions useful as underfill sealants for use with low-k dielectric-containing semiconductor devices Henkel IP & Holding GmbH (DE) 2014-04-15 US disclosed
US-20110133344-A1 CURABLE RESIN COMPOSITIONS USEFUL AS UNDERFILL SEALANTS FOR USE WITH LOW-K DIELECTRIC-CONTAINING SEMICONDUCTOR DEVICES HENKEL CORPORATION (US) 2011-06-09 US disclosed
US-7601480-B2 Photoactive compounds AZ ELECTRONIC MATERIALS USA CORP. (US) 2009-10-13 US disclosed
US-20090107632-A1 ADHESIVE COMPOSITIONS FOR HIGH TEMPERATURE SENSORS AND METHODS OF MAKING THE SAME GENERAL ELECTRIC COMPANY (US) 2009-04-30 US disclosed
US-20080153032-A1 Photoactive Compounds MERCK PATENT GMBH (DE) 2008-06-26 US disclosed
EP-0832936-B2 Photo-curable liquid silicone rubber compositions for templating mother molds SHINETSU CHEMICAL CO (JP) 2008-03-12 EP disclosed
US-7125236-B2 Replica molding SHIN - ETSU CHEMICAL CO. LTD. (JP) 2006-10-24 US disclosed
US-6969576-B2 Photosensitive dissolution inhibitors and resists based on onium salt carboxylates SANDIA NATIONAL LABORATORIES (US) 2005-11-29 US disclosed
US-20030104310-A1 Photosensitive dissolution inhibitors and resists based on onium salt carboxylates NATIONAL TECHNOLOGY & ENGINEERING SOLUTIONS OF SANDIA, LLC 2003-06-05 US disclosed
EP-0832726-B1 Replica molding SHONAN DESIGN CO LTD (JP) 2003-05-21 EP disclosed
EP-1309645-A2 USE OF CROSS-LINKER AND COMPOSITIONS MADE THEREFROM UCB S.A. (BE) 2003-05-14 EP disclosed
EP-0832936-B1 Photo-curable liquid silicone rubber compositions for templating mother molds SHINETSU CHEMICAL CO (JP) 2002-12-18 EP disclosed
US-20020113334-A1 Replica molding ASAHI KASEI KABUSHIKI KAISHA (JP) 2002-08-22 US disclosed
WO-2002008309-A2 USE OF CROSS-LINKER AND COMPOSITIONS MADE THEREFROM UCB S.A. (BE) 2002-01-31 WO disclosed
US-6342178-B1 FILLING MOLD CAVITY WITH PHOTOCURABLE LIQUID; IRRADIATION WITH LIGHT TO CURE; RADIATION TRANSPARENT; HIGH SPEED, SIMPLIFIED; APPLIANCES, AUTOMOBILES ASAHI KASEI KABUSHIKI KAISHA (JP) 2002-01-29 US disclosed
US-5952397-A CURABLE UPON EXPOSURE TO LIGHT INTO PRODUCT HAVING SHORE A HARDNESS OF 20 TO 60 AND LIGHT TRANSMITTANCE OF 10% AT WALL GAGE OF 10 MM; FOR FORMING TEMPLATING MOTHER MOLD WHICH ALLOWS RESIN CAST THEREIN TO BE CURED WITH LIGHT TRANSMITTED BY WALL SHIN-ETSU CHEMICAL CO., LTD. (JP) 1999-09-14 US disclosed
EP-0832936-A1 Photo-curable liquid silicone rubber compositions for templating mother molds SHIN-ETSU CHEMICAL CO., LTD. (JP) 1998-04-01 EP disclosed
EP-0832726-A2 Replica molding Shonan Design Co., Ltd. (JP) 1998-04-01 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20080153032-A1 Photoactive Compounds SUN2, CRY2, SCO2 MEN1 2182/4885NR1I2 3584/4885LMNA 3487/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.