Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP26A1 | O43174 | 9/20 | 0.72 |
| ▸ | CYP19A1 | P11511 | 5/20 | 0.58 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.58 |
| ▸ | CYP24A1 | Q07973 | 2/20 | 0.46 |
| ▸ | CYP17A1 | P05093 | 1/20 | 0.45 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.44 |
| ▸ | P4HB | P07237 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20390005 | 0.88 | CYP26A1 (0.63) | CYP26A1CYP19A1KMT2ACYP24A1CYP17A1 | |
| SCHEMBL19999188 | 0.82 | CYP19A1 (0.69) | CYP26A1CYP19A1KMT2ACYP17A1CYP3A4 | |
| SCHEMBL4276636 | 0.81 | CYP26A1 (1.00) | CYP26A1CYP3A4 | |
| SCHEMBL13573940 | 0.81 | CYP26A1 (1.00) | CYP26A1CYP3A4 | |
| SCHEMBL13573935 | 0.81 | CYP26A1 (1.00) | CYP26A1CYP3A4 | |
| SCHEMBL19999183 | 0.77 | CYP19A1 (0.62) | CYP26A1CYP19A1CYP3A4 | |
| SCHEMBL19054896 | 0.76 | CYP19A1 (0.73) | CYP26A1CYP19A1KMT2ACYP17A1P4HB | |
| SCHEMBL19054885 | 0.74 | CYP19A1 (0.58) | CYP26A1CYP19A1KMT2ACYP24A1CYP17A1 | |
| SCHEMBL27618666 | 0.74 | CYP19A1 (0.76) | CYP26A1CYP19A1KMT2ACYP17A1CYP3A4 | |
| SCHEMBL20830319 | 0.73 | CYP19A1 (0.59) | CYP26A1CYP19A1KMT2ACYP24A1CYP17A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11111397-B2 | Silica-based film-forming composition, method of producing substrate including silica-based film, and additive added to silica-based film-forming composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-09-07 | — | — | US | disclosed |
| US-10364372-B2 | Composition and method of producing siliceous film | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-07-30 | — | — | US | disclosed |
| US-20180201807-A1 | COMPOSITION AND METHOD OF PRODUCING SILICEOUS FILM | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-07-19 | — | — | US | disclosed |
| US-20180201807-A1 | COMPOSITION AND METHOD OF PRODUCING SILICEOUS FILM | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-07-19 | — | — | US | disclosed |