SCHEMBL204165

SCHEMBL204165

CCCCO[Si](C)(CCCOCC1CO1)OCCCC

nearest known ligand 0.71

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 1/20 0.71
ALDH1A1 P00352 5/20 0.62
TDP1 Q9NUW8 1/20 0.62
TSHR P16473 2/20 0.53
PDK1 Q15118 1/20 0.37
MAPK1 P28482 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15378122 0.97 SMN1; SMN2 (0.67) SMN1; SMN2ALDH1A1TDP1TSHRPDK1
SCHEMBL6567828 0.95 ALDH1A1 (0.70) SMN1; SMN2ALDH1A1TDP1TSHRPDK1
SCHEMBL230763 0.92 SMN1; SMN2 (0.62) SMN1; SMN2ALDH1A1TDP1TSHRPDK1
SCHEMBL14826036 0.89 SMN1; SMN2 (0.59) SMN1; SMN2ALDH1A1TDP1TSHRPDK1
SCHEMBL3792866 0.88 SMN1; SMN2 (0.57) SMN1; SMN2ALDH1A1TDP1TSHRPDK1
SCHEMBL134331 0.87 SMN1; SMN2 (0.71) SMN1; SMN2ALDH1A1TDP1TSHRPDK1
SCHEMBL8925522 0.87 SMN1; SMN2 (0.71) SMN1; SMN2ALDH1A1TDP1TSHRPDK1
SCHEMBL845306 0.87 SMN1; SMN2 (0.71) SMN1; SMN2ALDH1A1TDP1TSHRPDK1
SCHEMBL844976 0.87 SMN1; SMN2 (0.71) SMN1; SMN2ALDH1A1TDP1TSHRPDK1
SCHEMBL10876878 0.87 SMN1; SMN2 (0.59) SMN1; SMN2ALDH1A1TDP1TSHRPDK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 583 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116075559-B Optical article with low interference fringe and coating agent composition thereof 日本精化株式会社 2023-12-05 CN claimed
US-20230348750-A1 LOW INTERFERENCE FRINGE OPTICAL ARTICLE AND COATING AGENT COMPOSITION THEREOF NIPPON FINE CHEMICAL CO., LTD. (JP) 2023-11-02 US claimed
CN-115746616-A Surface-modified hollow silica particles and surface-modified hollow silica dispersion 凯斯科技股份有限公司 2023-03-07 CN claimed
CN-112831206-A Inorganic oxide dispersion with controllable water content and preparation method thereof 凯斯科技股份有限公司 2021-05-25 CN claimed
US-7256238-B2 Modified block copolymer ASAHI KASEI CHEMICALS CORPORATION (JP) 2007-08-14 US claimed
EP-1199313-B1 Diene polymers and copolymers having an alkoxysilane group BRIDGESTONE CORP (JP) 2005-08-24 EP claimed
US-6391433-B1 None US disclosed
EP-4602644-A1 A METHOD OF PRODUCING SEMICONDUCTOR DEVICES COMPRISING LOW DIELECTRIC CONSTANT THIN FILMS Pibond Oy (FI) 2025-08-20 EP disclosed
WO-2025093814-A1 LITHOGRAPHY METHODS, AND ELEMENTS AND DEVICES OBTAINABLE BY THE METHODS PIBOND OY (FI) 2025-05-08 WO disclosed
CN-119948595-A Method for producing semiconductor device containing low dielectric constant film 彼博股份有限公司 2025-05-06 CN disclosed
CN-119768742-A Composition for forming silicon-containing resist underlayer film 日产化学株式会社 2025-04-04 CN disclosed
CN-119563142-A Composition for forming silicon-containing resist underlayer film containing multifunctional sulfonic acid 日产化学株式会社 2025-03-04 CN disclosed
CN-119487453-A Method for manufacturing laminate and method for manufacturing semiconductor element 日产化学株式会社 2025-02-18 CN disclosed
US-4895767-A EPOXY RESIN, SILICON COMPOUND TORAY INDUSTRIES, INC. (JP) 1990-01-23 US disclosed
EP-0342233-A1 PROCESSING SOLUTION FOR PREVENTING REFLECTION OF OPTICAL PARTS AND PROCESS FOR PREVENTING REFLECTION USING THE SOLUTION ITO OPTICAL INDUSTRIAL CO., LTD. (JP) 1989-11-23 EP disclosed
US-4765729-A POLYSILOXANES AS SURFACE COATINGS; SCRATCH RESISTANCE TORAY INDUSTRIES, INC. (JP) 1988-08-23 US disclosed
EP-0278060-A2 Anti-reflection optical article and process of producing the same TORAY INDUSTRIES, INC. (JP) 1988-08-17 EP disclosed
EP-0207775-A2 Ornamental articles having a coating membrane TORAY INDUSTRIES, INC. (JP) 1987-01-07 EP disclosed
US-4590117-A HARDENED LAYERS OF OXIDES OF ALUMINUM, TITANIUM AND/OR ZIRCONIUM AND A POLYSILOXANE; DYEABILITY; LENS TORAY INDUSTRIES, INC. (JP) 1986-05-20 US disclosed
US-4026826-A ALKOXYSILANES JAPAN ATOMIC ENERGY RESEARCH INSTITUTE (JA) 1977-05-31 US disclosed