SCHEMBL2044455

SCHEMBL2044455

O=C(O)C12CCCCC1(C(=O)OCCCCCCCCCCCCCCCCC13OC1O3)O2

nearest known ligand 0.32

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
CYP4F2 P78329 1/20 0.32
CYP4A11 Q02928 1/20 0.32
SIGMAR1 Q99720 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17976527 0.83 NAAA (0.41)
SCHEMBL2678283 0.83 NAAA (0.41)
SCHEMBL454844 0.77 NAAA (0.46)
SCHEMBL10494391 0.77 NAAA (0.46)
SCHEMBL15654 0.77 NAAA (0.46)
Hydrogen Sulfide SCHEMBL28085415 0.76 NAAA (0.44)
SCHEMBL703883 0.71 CYP4F2 (0.33) CYP4F2CYP4A11
SCHEMBL8973996 0.70 PRKCA (0.33)
SCHEMBL2044453 0.68 CYP4F2 (0.35) CYP4F2CYP4A11
SCHEMBL181588 0.67 CYP2C19 (0.37)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 40 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024010080-A1 UV-CURABLE PRINTING INK COMPOSITION, AND PRODUCTION METHOD AND CURED COATING FILM OF SAME 株式会社カネカ 2024-01-11 WO disclosed
WO-2023248932-A1 GREEN SHEET AND SINTERED COMPACT, AND METHODS FOR PRODUCING THOSE AGC株式会社 2023-12-28 WO disclosed
US-20230365734-A1 LATEX AND RESIN COMPOSITION, AND METHODS FOR PRODUCING SAME KANEKA CORPORATION (JP) 2023-11-16 US disclosed
WO-2023190135-A1 STRESS REDUCING AGENT AND RESIN COMPOSITION 株式会社カネカ 2023-10-05 WO disclosed
WO-2023190466-A1 MODIFIER FOR POLYACETAL RESIN, POLYACETAL RESIN COMPOSITION, AND METHOD FOR PRODUCING MODIFIER FOR POLYACETAL RESIN 株式会社カネカ 2023-10-05 WO disclosed
EP-4223810-A1 LATEX AND RESIN COMPOSITION, AND METHODS FOR PRODUCING SAME Kaneka Corporation (JP) 2023-08-09 EP disclosed
EP-3904453-B1 RESIN COMPOSITION AND USE FOR SAME KANEKA CORP (JP) 2023-05-10 EP disclosed
US-20220213311-A1 PARTICULATE AND METHOD FOR PRODUCING PARTICULATE KANEKA CORPORATION (JP) 2022-07-07 US disclosed
EP-3995527-A1 MOLDED BODY INCLUDING POLYCARBONATE-BASED RESIN COMPOSITION Idemitsu Kosan Co.,Ltd. (JP) 2022-05-11 EP disclosed
EP-3995540-A1 POLYCARBONATE RESIN COMPOSITION Idemitsu Kosan Co.,Ltd. (JP) 2022-05-11 EP disclosed
EP-2810991-B1 POLYCARBONATE RESIN COMPOSITION AND MOLDED ARTICLE IDEMITSU KOSAN CO (JP) 2017-09-20 EP disclosed
EP-3173434-A1 THERMOSETTING RESIN COMPOSITION AND MOLDED BODY THEREOF MITSUBISHI CHEMICAL CORPORATION (JP) 2017-05-31 EP disclosed
US-20170130006-A1 THERMOSETTING RESIN COMPOSITION AND MOLDED BODY THEREOF MITSUBISHI CHEMICAL CORPORATION (JP) 2017-05-11 US disclosed
US-9499694-B2 Polycarbonate resin composition and molded article IDEMITSU KOSAN CO., LTD. (JP) 2016-11-22 US disclosed
US-20150086907-A1 PHOTOSENSITIVE COMPOSITION FOR VOLUME HOLOGRAM RECORDING, VOLUME HOLOGRAM RECORDING MEDIUM USING SAME, METHOD FOR MANUFACTURING VOLUME HOLOGRAM RECORDING MEDIUM, AND HOLOGRAM RECORDING METHOD DAICEL CORPORATION (JP) 2015-03-26 US disclosed
EP-2810991-A1 POLYCARBONATE RESIN COMPOSITION AND MOLDED ARTICLE Idemitsu Kosan Co., Ltd (JP) 2014-12-10 EP disclosed
US-20140343200-A1 POLYCARBONATE RESIN COMPOSITION AND MOLDED ARTICLE IDEMITSU KOSAN CO., LTD. (JP) 2014-11-20 US disclosed
EP-2093074-B1 Eraser TOMBOW PENCIL (JP) 2011-06-01 EP disclosed
EP-2093074-A2 Eraser TOMBOW PENCIL CO., LTD. (JP) 2009-08-26 EP disclosed
US-20090209686-A1 Eraser TOMBOW PENCIL CO., LTD. (JP) 2009-08-20 US disclosed