SCHEMBL2044698

SCHEMBL2044698

CC(=O)O[SiH3].CC(=O)Oc1ccccc1OC(C)=O

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTGS2 P35354 10/20 0.59
KDM4E B2RXH2 3/20 0.59
HSD17B10 Q99714 2/20 0.59
ALDH1A1 P00352 2/20 0.59
TSHR P16473 2/20 0.59
ESR1 P03372 1/20 0.59
ITGB3 P05106 1/20 0.59
ITGA2B P08514 1/20 0.59
HMGB1 P09429 1/20 0.59
HPGD P15428 1/20 0.59
GGT1 P19440 1/20 0.59
PTGS1 P23219 1/20 0.59
BLM P54132 1/20 0.59
NAPRT Q6XQN6 1/20 0.59
TDP1 Q9NUW8 1/20 0.59
LMNA P02545 1/20 0.52
CYP1A2 P05177 1/20 0.52
CYP2C9 P11712 1/20 0.52
MAPK1 P28482 1/20 0.48
ACHE P22303 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL338196 0.91 PTGS2 (0.68) PTGS2KDM4EHSD17B10ALDH1A1TSHR
SCHEMBL29432883 0.91 PTGS2 (0.68) PTGS2KDM4EHSD17B10ALDH1A1TSHR
Iodide SCHEMBL30619798 0.88 PTGS2 (0.65) PTGS2KDM4EHSD17B10ALDH1A1TSHR
SCHEMBL29094408 0.88 PTGS2 (0.52) PTGS2KDM4EHSD17B10ALDH1A1TSHR
Ethylene SCHEMBL28225928 0.86 PTGS2 (0.63) PTGS2KDM4EHSD17B10ALDH1A1TSHR
SCHEMBL10496464 0.84 PTGS2 (0.61) PTGS2KDM4EHSD17B10ALDH1A1TSHR
SCHEMBL29048095 0.82 MAPK1 (0.54) PTGS2KDM4EHSD17B10ALDH1A1TSHR
SCHEMBL29655351 0.82 CA12 (0.59) PTGS2KDM4EHSD17B10ALDH1A1TSHR
SCHEMBL236191 0.82 CA12 (0.59) PTGS2KDM4EHSD17B10ALDH1A1TSHR
Acetic Acid Phenyl Ester SCHEMBL10483586 0.80 ELANE (0.62) PTGS2KDM4EHSD17B10ALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2142960-A1 ALKALINE-RESISTANT NEGATIVE PHOTORESIST FOR SILICON WET-ETCH WITHOUT SILICON NITRIDE Brewer Science, Inc. (US) 2010-01-13 EP claimed
WO-2008127785-A1 ALKALINE-RESISTANT NEGATIVE PHOTORESIST FOR SILICON WET-ETCH WITHOUT SILICON NITRIDE BREWER SCIENCE INC. (US) 2008-10-23 WO claimed
CN-122055417-A Resin composition containing modified cellulose fibers and method for producing modified cellulose fibers 花王株式会社 2026-05-15 CN disclosed
CN-121586750-A Composition for forming silicon-containing underlayer film for directional self-assembly 日产化学株式会社 2026-02-27 CN disclosed
CN-120157884-A Alkoxy silicone resin intermediate and preparation method thereof 万华化学集团股份有限公司 2025-06-17 CN disclosed
CN-119490814-A Bi-component condensation deacidification type silicone adhesive capable of being rapidly and deeply cured and preparation method thereof 万华化学集团股份有限公司 2025-02-21 CN disclosed
CN-111381470-B Toner and method for producing the same 佳能株式会社 2024-05-24 CN disclosed
CN-108499525-B Preparation method of adsorbent for purifying hydrogen peroxide solution and purification method of hydrogen peroxide 中触媒新材料股份有限公司 2021-02-12 CN disclosed
US-9493620-B2 Optical film, anti-reflection film, polarizing plate and liquid crystal display device KONICA MINOLTA OPTO, INC. (JP) 2016-11-15 US disclosed
US-20110151146-A1 OPTICAL FILM, ANTI-REFLECTION FILM, POLARIZING PLATE AND LIQUID CRYSTAL DISPLAY DEVICE KONICA MINOLTA OPTO, INC. (JP) 2011-06-23 US disclosed
US-20070128368-A1 Method for production of functional film, substrate conveyance apparatus, and functional film produced with the method KONICA MINOLTA OPTO, INC. (JP) 2007-06-07 US disclosed
US-6824880-B1 DEPOSITING AT LEAST ONE RESISTIVE METAL LAYER ON A SIDE OF THE METAL FOIL; APPLYING ADHESION-PROMOTING MATERIAL OVER AND ADHERED TO THE RESISTIVE METAL LAYER; AND LAMINATING THE RESISTIVE METAL LAYER GA-TEK, INC. 2004-11-30 US disclosed
US-6248401-B1 VAPOR DEPOSITING METALLIC TREATMENT LAYER ON UNTREATED COPPER FOIL, APPLYING LAYER OF ADHESION-PROMOTING MATERIAL OVER AND ADHERED TO SAID TREATMENT LAYER FOR ENHANCING ADHESION BETWEEN FOIL AND LAMINATING MATERIALS NIKKO MATERIALS USA, INC. 2001-06-19 US disclosed
US-5709957-A Metallic body with vapor-deposited treatment layer(s) and adhesion-promoting layer GOULD ELECTRONICS INC. (US) 1998-01-20 US disclosed
EP-0678596-A1 Metallic body with vapor-deposited treatment layer(s) and adhesion-promoting layer GOULD ELECTRONICS INC. (US) 1995-10-25 EP disclosed
EP-0342233-B1 PROCESSING SOLUTION FOR PREVENTING REFLECTION OF OPTICAL PARTS AND PROCESS FOR PREVENTING REFLECTION USING THE SOLUTION ITO OPTICAL IND CO LTD (JP) 1994-03-30 EP disclosed
US-5049414-A Antireflection solution for optical parts and method for antireflection treatment using said solution ITO OPTICAL INDUSTRIAL CO., LTD. (JP) 1991-09-17 US disclosed
EP-0342233-A1 PROCESSING SOLUTION FOR PREVENTING REFLECTION OF OPTICAL PARTS AND PROCESS FOR PREVENTING REFLECTION USING THE SOLUTION ITO OPTICAL INDUSTRIAL CO., LTD. (JP) 1989-11-23 EP disclosed
US-4678468-A HEPARIN IN INTERPENETRATING POLYMER NETWORK BIO-MEDICAL CO., LTD. (JP) 1987-07-07 US disclosed