SCHEMBL20456935

SCHEMBL20456935

CCCC(=O)OC(C)C(F)(F)F

nearest known ligand 0.44

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.44
LMNA P02545 4/20 0.43
MAPT P10636 1/20 0.36
MAPK1 P28482 1/20 0.36
L3MBTL1 Q9Y468 1/20 0.36
FAAH O00519 8/20 0.33
CES1 P23141 6/20 0.33
CES2 O00748 3/20 0.33
ALOX15 P16050 1/20 0.33
MEN1 O00255 1/20 0.32
CYP1A2 P05177 1/20 0.32
KMT2A Q03164 1/20 0.32
HSD17B10 Q99714 1/20 0.32
FFAR3 O14843 1/20 0.32
HDAC3 O15379 1/20 0.32
HDAC1 Q13547 1/20 0.32
HDAC2 Q92769 1/20 0.32
HDAC8 Q9BY41 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15671204 0.89 LMNA (0.38) LMNAMAPTMAPK1
SCHEMBL13856070 0.84 ALDH1A1 (0.41) ALDH1A1LMNAMAPTMAPK1L3MBTL1
SCHEMBL24083140 0.83 MEN1 (0.35) ALDH1A1LMNAALOX15MEN1KMT2A
SCHEMBL14204600 0.82 LMNA (0.44) ALDH1A1LMNAMAPTMAPK1L3MBTL1
SCHEMBL27603903 0.82 CYP1A2 (0.41) ALDH1A1LMNAL3MBTL1CYP1A2KMT2A
SCHEMBL15671203 0.82 EGLN1 (0.41) LMNAMAPTMAPK1CYP1A2FFAR3
SCHEMBL19186658 0.81 ALDH1A1 (0.46) ALDH1A1LMNAMAPTMAPK1L3MBTL1
SCHEMBL12122838 0.81 LMNA (0.42) ALDH1A1LMNAMAPTMAPK1FAAH
SCHEMBL11991263 0.80 LMNA (0.41) ALDH1A1LMNAMAPTMAPK1L3MBTL1
SCHEMBL25779946 0.79 LMNA (0.43) ALDH1A1LMNAMAPTMAPK1FAAH

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10042258-B2 Composition for forming a resist upper-layer film and method for producing a semiconductor device using the composition NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2018-08-07 US disclosed
CN-1942431-B Haloalkyl carboxamides for preventing micro-organisms BAYER CROPSCIENCE AG 2010-06-23 CN disclosed
CN-1942431-A Haloalkyl carboxamides for controlling micro-organisms BAYER CROPSCIENCE AG (DE) 2007-04-04 CN disclosed