SCHEMBL20500151

SCHEMBL20500151

CCCCC[Si](CCCCC)(CCCCC)N(C)C

nearest known ligand 0.39

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
DNM1 Q05193 7/20 0.39
TSHR P16473 5/20 0.39
THRB P10828 1/20 0.39
LMNA P02545 3/20 0.33
SLC22A1 O15245 2/20 0.32
SLC22A2 O15244 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
ALDH1A1 P00352 3/20 0.30
HSD17B10 Q99714 1/20 0.30
MEN1 O00255 1/20 0.30
KMT2A Q03164 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2267526 0.91 TSHR (0.35) DNM1TSHRTHRBLMNAALDH1A1
SCHEMBL2271154 0.86 DNM1 (0.32) DNM1TSHRTHRBLMNA
SCHEMBL2266296 0.80 DNM1 (0.32) DNM1TSHRTHRBLMNA
SCHEMBL523859 0.79 DNM1 (0.34) DNM1TSHRTHRB
SCHEMBL2272367 0.78
SCHEMBL19307272 0.77 DNM1 (0.39) DNM1TSHRTHRBLMNASLC22A1
SCHEMBL2272825 0.76
SCHEMBL19307267 0.74 TSHR (0.44) DNM1TSHRTHRBLMNASLC22A1
SCHEMBL19307289 0.74 TSHR (0.44) DNM1TSHRTHRBLMNASLC22A1
SCHEMBL19307317 0.74 TSHR (0.44) DNM1TSHRTHRBLMNASLC22A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11670512-B2 Selective deposition on silicon containing surfaces VERSUM MATERIALS US, LLC (US) 2023-06-06 US claimed
CN-110612364-B Selective deposition on silicon-containing surfaces 弗萨姆材料美国有限责任公司 2022-04-05 CN claimed
US-20210118684-A1 SELECTIVE DEPOSITION ON SILICON CONTAINING SURFACES VERSUM MATERIALS US, LLC 2021-04-22 US claimed
CN-110612364-A Selective deposition on silicon-containing surfaces 弗萨姆材料美国有限责任公司 2019-12-24 CN claimed
WO-2018170382-A1 SELECTIVE DEPOSITION ON SILICON CONTAINING SURFACES VERSUM MATERIALS US, LLC (US) 2018-09-20 WO claimed
US-11670512-B2 Selective deposition on silicon containing surfaces VERSUM MATERIALS US, LLC (US) 2023-06-06 US disclosed
CN-110612364-B Selective deposition on silicon-containing surfaces 弗萨姆材料美国有限责任公司 2022-04-05 CN disclosed
US-20210118684-A1 SELECTIVE DEPOSITION ON SILICON CONTAINING SURFACES VERSUM MATERIALS US, LLC 2021-04-22 US disclosed
CN-110612364-A Selective deposition on silicon-containing surfaces 弗萨姆材料美国有限责任公司 2019-12-24 CN disclosed
WO-2018170382-A1 SELECTIVE DEPOSITION ON SILICON CONTAINING SURFACES VERSUM MATERIALS US, LLC (US) 2018-09-20 WO disclosed