SCHEMBL20500232

SCHEMBL20500232

CCC(C)(C)N[Si](CCC(F)(F)F)(CCC(F)(F)F)CCC(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6028313 0.71 TSHR (0.32)
SCHEMBL20500175 0.70
SCHEMBL20500177 0.67
SCHEMBL20500180 0.64
SCHEMBL6027786 0.63 TSHR (0.33)
SCHEMBL17102759 0.63 TSHR (0.33)
SCHEMBL21558111 0.61
SCHEMBL28885013 0.61
SCHEMBL6027606 0.61 EPHX1 (0.31)
SCHEMBL3889963 0.59

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11670512-B2 Selective deposition on silicon containing surfaces VERSUM MATERIALS US, LLC (US) 2023-06-06 US claimed
US-20210118684-A1 SELECTIVE DEPOSITION ON SILICON CONTAINING SURFACES VERSUM MATERIALS US, LLC 2021-04-22 US claimed
WO-2018170382-A1 SELECTIVE DEPOSITION ON SILICON CONTAINING SURFACES VERSUM MATERIALS US, LLC (US) 2018-09-20 WO claimed
US-11670512-B2 Selective deposition on silicon containing surfaces VERSUM MATERIALS US, LLC (US) 2023-06-06 US disclosed
US-20210118684-A1 SELECTIVE DEPOSITION ON SILICON CONTAINING SURFACES VERSUM MATERIALS US, LLC 2021-04-22 US disclosed
WO-2018170382-A1 SELECTIVE DEPOSITION ON SILICON CONTAINING SURFACES VERSUM MATERIALS US, LLC (US) 2018-09-20 WO disclosed