Fluorene

Fluorene

SCHEMBL2050161

C=CC(=O)OOOC(=O)C=C.Oc1ccccc1.Oc1ccccc1.c1ccc2c(c1)Cc1ccccc1-2

nearest known ligand 0.42

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SRD5A2 P31213 1/20 0.42
MIF P14174 2/20 0.38
MAPT P10636 2/20 0.38
CYP1A2 P05177 2/20 0.37
CYP3A4 P08684 1/20 0.37
HSD17B10 Q99714 1/20 0.37
MAOA P21397 2/20 0.37
HTR2C P28335 2/20 0.35
HTR2B P41595 2/20 0.35
ADRA2A P08913 1/20 0.35
SLC6A2 P23975 1/20 0.35
SLC6A4 P31645 1/20 0.35
THRB P10828 1/20 0.35
GPR84 Q9NQS5 1/20 0.34
ALDH1A1 P00352 2/20 0.34
NPC1 O15118 2/20 0.34
RAB9A P51151 2/20 0.34
DRD2 P14416 1/20 0.34
ADRA1D P25100 1/20 0.34
HTR2A P28223 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Fluorene SCHEMBL476957 0.92 SRD5A2 (0.44) SRD5A2MAPTCYP1A2CYP3A4HSD17B10
Phenol SCHEMBL17685702 0.86 CA12 (0.44) MAPTCYP3A4MAOATHRBRAB9A
Phenol SCHEMBL2227325 0.86 CA12 (0.44) MAPTCYP3A4MAOATHRBRAB9A
Fluorene SCHEMBL27547758 0.85 RAB9A (0.42) SRD5A2MIFMAPTCYP1A2CYP3A4
Fluorene SCHEMBL18694558 0.84 SRD5A2 (0.49) SRD5A2MIFMAPTCYP1A2CYP3A4
Phenol SCHEMBL1415095 0.84 CA12 (0.42) MIFMAPTCYP3A4MAOATHRB
Fluorene SCHEMBL1315275 0.78 SRD5A2 (0.46) SRD5A2MAPTCYP1A2CYP3A4HSD17B10
Fluorene SCHEMBL28047765 0.78 SRD5A2 (0.41) SRD5A2MIFMAPTCYP1A2CYP3A4
Fluorene SCHEMBL31174575 0.77 SRD5A2 (0.55) SRD5A2MIFMAPTCYP1A2CYP3A4
Fluorene SCHEMBL29436955 0.77 SRD5A2 (0.55) SRD5A2MIFMAPTCYP1A2CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 207 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024106773-A1 PHOTOPOLYMER COMPOSITION, PHOTOPOLYMER FILM, HOLOGRAM RECORDING MEDIUM, OPTICAL ELEMENT, AND HOLOGRAPHIC RECORDING METHOD 주식회사 엘지화학 2024-05-23 WO claimed
CN-114864784-B Light emitting diode and light emitting device 泉州三安半导体科技有限公司 2024-04-23 CN claimed
CN-116845154-A Colorful miniature light-emitting diode and display device 泉州三安半导体科技有限公司 2023-10-03 CN claimed
CN-114864784-A Light-emitting diode and light-emitting device 厦门市三安光电科技有限公司 2022-08-05 CN claimed
CN-114613800-A Display device 友达光电股份有限公司 2022-06-10 CN claimed
CN-110471209-B Substrate, manufacturing method and display panel 上海中航光电子有限公司 2022-03-11 CN claimed
CN-110471209-A Substrate, production method and display panel SHANGHAI AVIC OPTOELECTRONICS 2019-11-19 CN claimed
CN-118290657-A Photocurable composition and application thereof 常州强力先端电子材料有限公司 2024-07-05 CN disclosed
CN-118251432-A Holographic recording medium, composition for forming photopolymer layer, and optical element 株式会社LG化学 2024-06-25 CN disclosed
WO-2024117657-A1 PHOTOPOLYMER FILM, COMPOSITION FOR FORMING PHOTOPOLYMER FILM, HOLOGRAM RECORDING MEDIUM, AND OPTICAL DEVICE 주식회사 엘지화학 2024-06-06 WO disclosed
US-12001141-B2 Photopolymer composition LG CHEM LTD. (KR) 2024-06-04 US disclosed
US-11994704-B2 Hologram medium LG CHEM, LTD. (KR) 2024-05-28 US disclosed
WO-2024106773-A1 PHOTOPOLYMER COMPOSITION, PHOTOPOLYMER FILM, HOLOGRAM RECORDING MEDIUM, OPTICAL ELEMENT, AND HOLOGRAPHIC RECORDING METHOD 주식회사 엘지화학 2024-05-23 WO disclosed
US-20140166947-A1 Photosensitive Resin Composition for Color Filter and Color Filter Using the Same CHEIL INDUSTRIES INC. (KR) 2014-06-19 US disclosed
CN-103869618-A Photosensitive Resin Composition for Color Filter and Color Filter Using the Same CHEIL IND INC 2014-06-18 CN disclosed
CN-103492948-A Photosensitive compound and photosensitive resin composition comprising same LG CHEMICAL LTD 2014-01-01 CN disclosed
CN-103329044-A Photosensitive resin composition and photosensitive material comprising the same LG CHEMICAL LTD 2013-09-25 CN disclosed
US-20120189961-A1 PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE MATERIAL COMPRISING THE SAME LG CHEM, LTD. (KR) 2012-07-26 US disclosed
US-20110151379-A1 BLACK MATRIX COMPOSITION WITH HIGH LIGHT-SHIELDING AND IMPROVED ADHESION PROPERTIES LG CHEM, LTD. (KR) 2011-06-23 US disclosed
US-20100092892-A1 PHOTOPOLYMERIZED RESIN LAMINATE AND METHOD FOR MANUFACTURING BOARD HAVING BLACK MATRIX PATTERN ASAHI KASEI E-MATERIALS CORPORATION (JP) 2010-04-15 US disclosed