SCHEMBL2050206

SCHEMBL2050206

C=CCC(=C)C(N)(CC=C)CC=C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL9283661 0.76
SCHEMBL504038 0.76 ALDH1A1 (0.30)
SCHEMBL19435073 0.75
SCHEMBL11089429 0.75
SCHEMBL10749250 0.72
SCHEMBL9511373 0.72
SCHEMBL8735005 0.70
SCHEMBL251529 0.70
SCHEMBL2236860 0.70
SCHEMBL7114233 0.69 HTT (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 106 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-58204073-A None JP disclosed
US-20240228876-A1 TREATMENT LIQUID FOR MANUFACTURING SEMICONDUCTOR AND METHOD OF TREATING OBJECT TO BE TREATED FUJIFILM CORPORATION (JP) 2024-07-11 US disclosed
WO-2023248649-A1 PROCESSING LIQUID, SUBSTRATE PROCESSING METHOD, AND MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE 富士フイルム株式会社 2023-12-28 WO disclosed
WO-2023162868-A1 COMPOSITION 富士フイルム株式会社 2023-08-31 WO disclosed
WO-2023054233-A1 COMPOSITION AND METHOD FOR PROCESSING OBJECT TO BE PROCESSED 富士フイルム株式会社 2023-04-06 WO disclosed
WO-2023047959-A1 TREATMENT LIQUID FOR SEMICONDUCTOR PRODUCTION AND TREATMENT METHOD FOR OBJECT TO BE TREATED 富士フイルム株式会社 2023-03-30 WO disclosed
WO-2022263244-A1 QUATERNIZED BETAINES AS ADDITIVES IN FUELS BASF SE (DE) 2022-12-22 WO disclosed
EP-1243442-B1 NONCONTACT IC CARD SONY CORP (JP) 2015-11-11 EP disclosed
US-8821841-B2 Copolymers for cosmetic applications BASF SE (DE) 2014-09-02 US disclosed
US-8652456-B2 Aqueous preparations comprising at least one water-soluble or water-dispersible copolymer with cationgenic groups BASF SE (DE) 2014-02-18 US disclosed
US-20010021375-A1 Cosmetic or dermatological sunscreen preparations BASF AKTIENGESELLSCHAFT (DE) 2001-09-13 US disclosed
CN-1309959-A Cosmetic or dermatological sunscreen preparation BASF AG (DE) 2001-08-29 CN disclosed
US-6191215-B1 POLYMERIZATION OF ETHYLENICALLY UNSATURATED MONOMERS IN SUPERCRITICAL CARBON DIOXIDE AS INERT DILUENT, IN PRESENCE POLYOXYALKYLENE-POLYSILOXANE COPOLYMERS BASF AKTIENGESELLSCHAFT (DE) 2001-02-20 US disclosed
WO-2000053639-A1 PROCESS FOR THE PREPARATION OF PULVERULENT POLYMERS BY POLYMERIZATION IN SUPERCRITICAL CARBON DIOXIDE IN THE PRESENCE OF POLYOXYALKYLENE-POLYSILOXANE COPOLYMERS BASF AKTIENGESELLSCHAFT (DE) 2000-09-14 WO disclosed
WO-2000047631-A1 INTERPOLYMERS BASF AKTIENGESELLSCHAFT (DE) 2000-08-17 WO disclosed
EP-0087311-B1 ADHESIVE COMPOSITIONS, METHOD OF MAKING LAMINATES USING THE COMPOSITION, AND LAMINATES MADE THEREBY MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1986-12-17 EP disclosed
US-4465542-A NITROGEN-FREE EPOXIDE, POLY-N-GLYCIDYL TYPE EPOXY RESIN, CARBOXYL-CONTAINING NITRILE RUBBER MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1984-08-14 US disclosed
JP-S58204073-A ADHESIVE COMPOSITION MITSUI PETROCHEM IND LTD 1983-11-28 JP disclosed
US-4410709-A Sulfobetaines AKADEMIE DER WISSENSCHAFTEN DER DDR (DD) 1983-10-18 US disclosed
US-4381980-A FROM AN N-SUBSTITUTED ALLYLAMMONIUM COMPOUND BY CATALYTIC SULFONATION WITH SULFUROUS ACID SALT AKADEMIE DER WISSENSCHAFTEN DER DDR (DD) 1983-05-03 US disclosed