⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18195846 | 0.78 | — | — | |
| SCHEMBL700295 | 0.74 | BRS3 (0.36) | — | |
| SCHEMBL686014 | 0.73 | CHRM3 (0.30) | — | |
| SCHEMBL18195941 | 0.70 | — | — | |
| SCHEMBL23015555 | 0.70 | ALDH1A1 (0.33) | — | |
| SCHEMBL107252 | 0.70 | ALDH1A1 (0.33) | — | |
| SCHEMBL18633945 | 0.69 | GSR (0.32) | — | |
| SCHEMBL10084905 | 0.68 | — | — | |
| SCHEMBL13225278 | 0.68 | — | — | |
| SCHEMBL15147014 | 0.67 | CHRM2 (0.41) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4405094-A1 | HIGH DEFINITION MOLECULAR ARRAY FEATURE GENERATION USING PHOTORESIST | 10X Genomics, Inc. (US) | 2024-07-31 | — | — | EP | disclosed |
| WO-2024006827-A1 | METHODS AND SYSTEMS FOR LIGHT-CONTROLLED SURFACE PATTERNING USING PHOTOMASKS | 10X GENOMICS, INC. (US) | 2024-01-04 | — | — | WO | disclosed |
| WO-2024006798-A1 | HIGH DEFINITION MOLECULAR ARRAY FEATURE GENERATION USING PHOTORESIST | 10X GENOMICS, INC. (US) | 2024-01-04 | — | — | WO | disclosed |
| EP-4271511-A1 | MOLECULAR ARRAY GENERATION USING PHOTORESIST | 10X Genomics, Inc. (US) | 2023-11-08 | — | — | EP | disclosed |
| EP-4058848-A1 | POSITIVE WORKING PHOTOSENSITIVE MATERIAL | Merck Patent GmbH (DE) | 2022-09-21 | — | — | EP | disclosed |
| WO-2022147140-A1 | MOLECULAR ARRAY GENERATION USING PHOTORESIST | 10X GENOMICS, INC. (US) | 2022-07-07 | — | — | WO | disclosed |
| EP-3394674-A1 | NEGATIVE-WORKING PHOTORESIST COMPOSITIONS FOR LASER ABLATION AND PROCESSES USING THEM | AZ Electronic Materials Luxembourg S.à.r.l. (LU) | 2018-10-31 | — | — | EP | disclosed |