SCHEMBL20565857

SCHEMBL20565857

CCn1c2ccc(C(=O)C(=NOC(C)=O)c3ccccc3C)cc2c2cc(C(=O)c3ccccc3C)ccc21

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 6/20 0.43
LMNA P02545 3/20 0.43
ALDH1A1 P00352 3/20 0.43
HPGD P15428 3/20 0.43
MEN1 O00255 2/20 0.43
KMT2A Q03164 2/20 0.43
SMN1; SMN2 Q16637 1/20 0.43
MAPT P10636 3/20 0.42
HTT P42858 2/20 0.42
MAPK1 P28482 2/20 0.37
NPSR1 Q6W5P4 2/20 0.37
POLB P06746 1/20 0.37
CNR2 P34972 1/20 0.37
L3MBTL1 Q9Y468 1/20 0.36
TUBB4A P04350 1/20 0.36
TUBB P07437 1/20 0.36
TUBA3C P0DPH7 1/20 0.36
TUBA1B P68363 1/20 0.36
TUBA4A P68366 1/20 0.36
TUBB4B P68371 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17856962 1.00 KDM4E (0.43) KDM4ELMNAALDH1A1HPGDMEN1
SCHEMBL17856961 0.95 KDM4E (0.40) KDM4ELMNAALDH1A1HPGDMEN1
SCHEMBL15499939 0.94 KDM4E (0.41) KDM4ELMNAALDH1A1HPGDMEN1
SCHEMBL23552887 0.93 KDM4E (0.41) KDM4ELMNAALDH1A1HPGDMEN1
SCHEMBL16774235 0.92 LMNA (0.42) KDM4ELMNAALDH1A1HPGDMEN1
SCHEMBL18354092 0.92 KDM4E (0.40) KDM4ELMNAALDH1A1HPGDMEN1
SCHEMBL17856960 0.92 KDM4E (0.40) KDM4ELMNAALDH1A1HPGDMEN1
SCHEMBL16757728 0.91 PTGES (0.45) KDM4ELMNAALDH1A1HPGDMEN1
SCHEMBL16757724 0.91 PTGES (0.45) KDM4ELMNAALDH1A1HPGDMEN1
SCHEMBL11960274 0.91 KDM4E (0.43) KDM4ELMNAALDH1A1HPGDMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11136435-B2 Method for producing polyimide film, polyimide film, polyamic acid solution, and photosensitive composition ENEOS CORPORATION (JP) 2021-10-05 US disclosed
EP-3406657-A1 METHOD FOR PRODUCING POLYIMIDE FILM, POLYIMIDE FILM, POLYAMIDE ACID SOLUTION AND PHOTOSENSITIVE COMPOSITION Tokyo Ohka Kogyo Co., Ltd. (JP) 2018-11-28 EP disclosed