Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.38 |
| ▸ | TSHR | P16473 | 6/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 5/20 | 0.33 |
| ▸ | ALOX12 | P18054 | 3/20 | 0.33 |
| ▸ | CA1 | P00915 | 2/20 | 0.33 |
| ▸ | CA2 | P00918 | 2/20 | 0.33 |
| ▸ | CA9 | Q16790 | 2/20 | 0.33 |
| ▸ | CA12 | O43570 | 1/20 | 0.33 |
| ▸ | GLA | P06280 | 1/20 | 0.33 |
| ▸ | CA3 | P07451 | 1/20 | 0.33 |
| ▸ | CA4 | P22748 | 1/20 | 0.33 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | ACHE | P22303 | 1/20 | 0.33 |
| ▸ | CA7 | P43166 | 1/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | HPGD | P15428 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | MGLL | Q99685 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Fluoride Ion SCHEMBL11224900 | 0.96 | ALDH1A1 (0.37) | ALDH1A1TSHRTDP1ALOX12CA1 | |
| Hydrochloric Acid SCHEMBL7520469 | 0.96 | ALDH1A1 (0.35) | ALDH1A1TSHRTDP1ALOX12CA1 | |
| Fluoride Ion SCHEMBL126104 | 0.96 | ALDH1A1 (0.37) | ALDH1A1TSHRTDP1ALOX12CA1 | |
| SCHEMBL10801908 | 0.96 | ALDH1A1 (0.40) | ALDH1A1TSHRTDP1ALOX12CA1 | |
| SCHEMBL47554 | 0.96 | ALDH1A1 (0.40) | ALDH1A1TSHRTDP1ALOX12CA1 | |
| Methane SCHEMBL2440754 | 0.92 | ALDH1A1 (0.38) | ALDH1A1TSHRTDP1ALOX12CA1 | |
| Fluoride Ion SCHEMBL10437963 | 0.92 | ALDH1A1 (0.39) | ALDH1A1TSHRTDP1ALOX12CA1 | |
| SCHEMBL12762137 | 0.92 | ALDH1A1 (0.38) | ALDH1A1TSHRTDP1ALOX12CA1 | |
| Methane SCHEMBL3253432 | 0.92 | ALDH1A1 (0.38) | ALDH1A1TSHRTDP1ALOX12CA1 | |
| Bromide SCHEMBL60557 | 0.92 | ALDH1A1 (0.38) | ALDH1A1TSHRTDP1ALOX12CA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9535326-B2 | Methods of manufacturing a semiconductor device | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2017-01-03 | — | — | US | disclosed |
| US-20150227046-A1 | METHODS OF MANUFACTURING A SEMICONDUCTOR DEVICE | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2015-08-13 | — | — | US | disclosed |
| US-7968275-B2 | Method of forming a pattern using a photoresist composition for immersion lithography | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2011-06-28 | — | — | US | disclosed |
| US-7781153-B2 | Polymer resin composition, related method for forming a pattern, and related method for fabricating a capacitor | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2010-08-24 | — | — | US | disclosed |
| US-20090176177-A1 | METHOD OF FORMING A PATTERN USING A PHOTORESIST COMPOSITION FOR IMMERSION LITHOGRAPHY | SAMSUNG ELECTRONICS CO., LTD. | 2009-07-09 | — | — | US | disclosed |
| US-20090092931-A1 | Methods of forming a blocking pattern using a photosensitive composition and methods of manufacturing a semiconductor device | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-04-09 | — | — | US | disclosed |
| US-7494761-B2 | Cyclodextrin derivative, photoresist composition including the cyclodextrin derivative and method of forming a pattern using the photoresist composition | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-02-24 | — | — | US | disclosed |
| US-7485407-B2 | Siloxane compound, photoresist composition including the siloxane compound and method of forming a pattern using the photoresist composition | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-02-03 | — | — | US | disclosed |
| US-7442489-B2 | Photoresist composition and method of forming a photoresist pattern using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2008-10-28 | — | — | US | disclosed |
| US-20080213699-A1 | PHOTORESIST COMPOSITION AND METHOD OF FORMING A PHOTORESIST PATTERN USING THE PHOTORESIST COMPOSITION | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2008-09-04 | — | — | US | disclosed |
| US-7326519-B2 | Photosensitive resin, photoresist composition having the photosensitive resin and method of forming a photoresist pattern using the photoresist composition | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2008-02-05 | — | — | US | disclosed |
| US-20070249117-A1 | Polymer resin composition, related method for forming a pattern, and related method for fabricating a capacitor | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-10-25 | — | — | US | disclosed |
| US-7258963-B2 | Photosensitive resin, photoresist composition having the photosensitive resin and method of forming a photoresist pattern by using the photoresist composition | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-08-21 | — | — | US | disclosed |
| US-20070166644-A1 | Photoresist composition and method of forming a photoresist pattern using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-07-19 | — | — | US | disclosed |
| US-20070148590-A1 | Siloxane compound, photoresist composition including the siloxane compound and method of forming a pattern using the photoresist composition | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-06-28 | — | — | US | disclosed |
| US-20060188821-A1 | Photosensitive resin, photoresist composition having the photosensitive resin and method of forming a photoresist pattern using the photoresist composition | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2006-08-24 | — | — | US | disclosed |
| US-20060160019-A1 | Photosensitive resin, photoresist composition having the photosensitive resin and method of forming a photoresist pattern by using the photoresist composition | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2006-07-20 | — | — | US | disclosed |
| US-20060160021-A1 | Photoresist composition and method of forming a photoresist pattern using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2006-07-20 | — | — | US | disclosed |
| US-20060160020-A1 | Photosensitive polymer, photoresist composition having the photosensitive polymer and method of forming a photoresist pattern using the photoresist composition | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2006-07-20 | — | — | US | disclosed |
| US-20060134549-A1 | Photosensitive polymer, photoresist composition including the photosensitive polymer and method of forming a photoresist pattern using the photoresist composition | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2006-06-22 | — | — | US | disclosed |