Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.40 |
| ▸ | TSHR | P16473 | 6/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 5/20 | 0.35 |
| ▸ | ALOX12 | P18054 | 3/20 | 0.35 |
| ▸ | CA1 | P00915 | 2/20 | 0.35 |
| ▸ | CA2 | P00918 | 2/20 | 0.35 |
| ▸ | CA9 | Q16790 | 2/20 | 0.35 |
| ▸ | CA12 | O43570 | 1/20 | 0.35 |
| ▸ | GLA | P06280 | 1/20 | 0.35 |
| ▸ | CA3 | P07451 | 1/20 | 0.35 |
| ▸ | CA4 | P22748 | 1/20 | 0.35 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.35 |
| ▸ | LMNA | P02545 | 1/20 | 0.35 |
| ▸ | ACHE | P22303 | 1/20 | 0.35 |
| ▸ | CA7 | P43166 | 1/20 | 0.35 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.33 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | HPGD | P15428 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10801908 | 1.00 | ALDH1A1 (0.40) | ALDH1A1TSHRTDP1ALOX12CA1 | |
| SCHEMBL126923 | 0.96 | ALDH1A1 (0.38) | ALDH1A1TSHRTDP1ALOX12CA1 | |
| SCHEMBL2058664 | 0.96 | ALDH1A1 (0.38) | ALDH1A1TSHRTDP1ALOX12CA1 | |
| SCHEMBL2058661 | 0.96 | ALDH1A1 (0.38) | ALDH1A1TSHRTDP1ALOX12CA1 | |
| Methane SCHEMBL3253432 | 0.96 | ALDH1A1 (0.38) | ALDH1A1TSHRTDP1ALOX12CA1 | |
| Bromide SCHEMBL60557 | 0.96 | ALDH1A1 (0.38) | ALDH1A1TSHRTDP1ALOX12CA1 | |
| Methane SCHEMBL2440754 | 0.96 | ALDH1A1 (0.38) | ALDH1A1TSHRTDP1ALOX12CA1 | |
| SCHEMBL12762137 | 0.96 | ALDH1A1 (0.38) | ALDH1A1TSHRTDP1ALOX12CA1 | |
| Fluoride Ion SCHEMBL10437963 | 0.96 | ALDH1A1 (0.39) | ALDH1A1TSHRTDP1ALOX12CA1 | |
| Iodide SCHEMBL58886 | 0.96 | ALDH1A1 (0.38) | ALDH1A1TSHRTDP1ALOX12CA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 19351 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-122085599-A | Composition, patterning method, formed pattern, semiconductor device and application thereof | — | 2026-05-26 | — | — | CN | claimed |
| CN-121873631-B | Spin-on carbon composition, semiconductor preparation method and semiconductor device | Jiageng Innovation Laboratory (CN) | 2026-05-26 | — | — | CN | claimed |
| CN-122043858-A | EUV patterned resist formation method | 亚历克斯·P·G·罗宾逊 | 2026-05-15 | — | — | CN | claimed |
| CN-122036578-A | Electrolyte additive for metal-sulfur battery, electrolyte and metal-sulfur battery | 东南大学 | 2026-05-15 | — | — | CN | claimed |
| CN-122011992-A | UV-curing-delaying packaging adhesive for OLED display panel, OLED display panel and manufacturing method of OLED display panel | 惠州硕贝德半导体材料有限公司 | 2026-05-12 | — | — | CN | claimed |
| CN-115981100-B | Hydrofluoric acid-resistant protective material for lithography and lithography process thereof | 湖南梵鑫新材料股份有限公司 | 2026-05-12 | — | — | CN | claimed |
| EP-4735260-A1 | EPOXY-BASED UV-VIS-CURABLE COMPOSITIONS | Sicpa Holding SA (CH) | 2026-05-06 | — | — | EP | claimed |
| EP-4565378-B1 | METHODS FOR PRODUCING OPTICAL EFFECT LAYERS COMPRISING MAGNETIC OR MAGNETIZABLE PIGMENT PARTICLES AND EXHIBITING ONE OR MORE INDICIA | SICPA HOLDING SA (CH) | 2026-05-06 | — | — | EP | claimed |
| US-20260044072-A1 | ZN-BASED ORGANICALLY-COORDINATED NANOPARTICLES, PHOTORESIST COMPOSITION, PREPARATION METHOD THEREFOR, AND USE THEREOF | BEIJING VFORTUNE NEW ENERGY POWER TECH DEVELOPMENT CO LTD (CN) | 2026-02-12 | — | — | US | claimed |
| US-20260042783-A1 | ZN-BASED ORGANIC COORDINATION NANOPARTICLES AND PREPARATION METHOD THEREFOR, PHOTORESIST COMPOSITION, AND USE THEREOF | UNIV TSINGHUA (CN) | 2026-02-12 | — | — | US | claimed |
| EP-0178208-A1 | Photosensitive film of a silicon-containing polymer and its use as a mask in photolithographic processes | COMMISSARIAT A L'ENERGIE ATOMIQUE (FR) | 1986-04-16 | — | — | EP | claimed |
| EP-0014785-B1 | COATING METHOD AND CURABLE COMPOSITIONS | GENERAL ELECTRIC COMPANY (US) | 1985-06-12 | — | — | EP | claimed |
| EP-0136679-A2 | Photopolymerizable epoxy resin composition | KABUSHIKI KAISHA TOSHIBA (JP) | 1985-04-10 | — | — | EP | claimed |
| US-4423136-A | Free radical curable resin compositions containing triarylsulfonium salt | GENERAL ELECTRIC COMPANY (US) | 1983-12-27 | — | — | US | claimed |
| US-4336363-A | ORGANIC OXIDIZERS | GENERAL ELECTRIC COMPANY (US) | 1982-06-22 | — | — | US | claimed |
| US-4273668-A | ETHYLENE CARBONATE, PHOTOINITIATORS | GENERAL ELECTRIC COMPANY (US) | 1981-06-16 | — | — | US | claimed |
| US-4245029-A | MIXTURES OF UNSATURATED AND OXIRANE COMPOUNDS FOR TOUGH, FLEXIBLE COATINGS | GENERAL ELECTRIC COMPANY (US) | 1981-01-13 | — | — | US | claimed |
| US-4225497-A | ACID CATALYSTS FOR IMIDATION | RHONE-POULENC INDUSTRIES (FR) | 1980-09-30 | — | — | US | claimed |
| US-4102687-A | UREA, PHENOLIC OR MELAMINE RESIN; SULFUR, SELENIUM, TELLURIUM PHOTOINITIATOR | GENERAL ELECTRIC COMPANY (US) | 1978-07-25 | — | — | US | claimed |
| US-3947495-A | OXIDATION OF PROPYLENE OR ISOBUTYLENE | NATIONAL DISTILLERS AND CHEMICAL CORPORATION (US) | 1976-03-30 | — | — | US | claimed |