SCHEMBL2058773

SCHEMBL2058773

C=Cc1cccc(C(C)OCC2CO2)c1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.39
TP53 P04637 4/20 0.39
TSHR P16473 3/20 0.39
HIF1A Q16665 2/20 0.39
CYP3A4 P08684 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
TDP1 Q9NUW8 2/20 0.36
GLA P06280 1/20 0.34
PTGS2 P35354 1/20 0.34
CHRM2 P08172 2/20 0.32
CHRM4 P08173 2/20 0.32
CHRM5 P08912 2/20 0.32
CHRM1 P11229 2/20 0.32
CHRM3 P20309 2/20 0.32
MEN1 O00255 2/20 0.30
KMT2A Q03164 2/20 0.30
MAPT P10636 2/20 0.30
HPGD P15428 2/20 0.30
CYP1A2 P05177 1/20 0.30
PPARG P37231 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2058774 0.83 ALDH1A1 (0.35) ALDH1A1TP53TSHRHIF1ACYP3A4
SCHEMBL9235403 0.78 TDP1 (0.50) ALDH1A1TP53TSHRHIF1ACYP3A4
SCHEMBL3890706 0.75 TP53 (0.34) ALDH1A1TP53TSHRHIF1ACYP3A4
SCHEMBL28297908 0.74 TP53 (0.36) ALDH1A1TP53TSHRHIF1ACYP3A4
SCHEMBL29162692 0.74 TP53 (0.48) ALDH1A1TP53TSHRCYP3A4TDP1
SCHEMBL1152445 0.73 TP53 (0.59) ALDH1A1TP53TSHRHIF1ACYP3A4
SCHEMBL7862299 0.73 TP53 (0.47) ALDH1A1TP53TSHRCYP3A4TDP1
SCHEMBL2394506 0.73 ALDH1A1 (0.70) ALDH1A1TP53TSHRHIF1ACYP3A4
SCHEMBL29547473 0.73 ALDH1A1 (0.70) ALDH1A1TP53TSHRHIF1ACYP3A4
SCHEMBL2059110 0.72 ALDH1A1 (0.39) ALDH1A1TP53TSHRHIF1ACYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 402 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113485071-B Colored resin composition, photoresist structure, color filter and display device using the same 住华科技股份有限公司 2025-06-24 CN disclosed
CN-120195932-A Colored resin composition, color filter and display device 住友化学株式会社 2025-06-24 CN disclosed
CN-120195931-A Colored resin composition, color filter and display device 住友化学株式会社 2025-06-24 CN disclosed
CN-120153320-A Colored curable resin composition, color filter, display device, and solid-state imaging element 住友化学株式会社 2025-06-13 CN disclosed
CN-120077108-A Compounds of formula (I) 住友化学株式会社 2025-05-30 CN disclosed
CN-120077106-A Curable composition, cured film, and display device 住友化学株式会社 2025-05-30 CN disclosed
CN-120035640-A Coloring agent 住友化学株式会社 2025-05-23 CN disclosed
CN-113050375-B Colored resin composition, color filter formed therefrom, and display device including the color filter 住华科技股份有限公司 2025-05-16 CN disclosed
CN-113264918-B Coloring composition, compound, color filter and display device 住友化学株式会社 2025-04-22 CN disclosed
CN-119689778-A Colored curable resin composition, color filter, display device, and solid-state imaging element 住友化学株式会社 2025-03-25 CN disclosed
EP-1296186-B1 Radiation sensitive resin composition, rib, rib forming method and display element JSR CORP (JP) 2006-06-07 EP disclosed
CN-1598695-A Method for forming pattern, and optical element JSR CORP (JP) 2005-03-23 CN disclosed
US-6852476-B2 Radiation sensitive resin composition, rib, rib forming method and display element JSR CORPORATION (JP) 2005-02-08 US disclosed
US-20030068574-A1 Radiation sensitive resin composition, rib, rib forming method and display element JSR CORPORATION (JP) 2003-04-10 US disclosed
EP-1296186-A1 Radiation sensitive resin composition, rib, rib forming method and display element JSR Corporation (JP) 2003-03-26 EP disclosed
EP-0880075-B1 Radiation sensitive resin composition JSR CORP (JP) 2001-10-17 EP disclosed
US-6168908-B1 COATING AN ALKALI-SOLUBLE THERMOSETTING RESIN ON A SUBSTRATE, AND BAKING IT, COATING A RADIATION SENSITIVE RESIN ON THE COATED FILM, AND BAKING, EXPOSING THE RADIATION SENSITIVE FILM TO A RADIATION THROUGH A MASK AND BAKING, DEVELOPING JSR CORPORATION (JP) 2001-01-02 US disclosed
US-5958648-A Radiation sensitive resin composition JSR CORPORATION (JP) 1999-09-28 US disclosed
EP-0908780-A1 Process for forming a cured film of a thermosetting resin JSR Corporation (JP) 1999-04-14 EP disclosed
EP-0880075-A1 Radiation sensitive resin composition JSR Corporation (JP) 1998-11-25 EP disclosed