SCHEMBL2059645

SCHEMBL2059645

N#CNC#N.c1ccc([PH](c2ccccc2)(c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.36

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.36
TRPA1 O75762 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Water SCHEMBL18039121 0.81 ALDH1A1 (0.38) TSHR
Thiocyanic Acid SCHEMBL28174693 0.79 TSHR (0.39) TSHRTRPA1
Cyanamide SCHEMBL9930186 0.79 TSHR (0.39) TSHRTRPA1
Benzene SCHEMBL28207368 0.78 ALDH1A1 (0.40) TSHR
SCHEMBL26674 0.78 ALDH1A1 (0.40) TSHR
SCHEMBL28748541 0.78 ALDH1A1 (0.40) TSHR
SCHEMBL6858490 0.75 TSHR (0.36) TSHRTRPA1
Hydrochloric Acid SCHEMBL8028044 0.74 ALDH1A1 (0.38) TSHR
Fluoride SCHEMBL3304552 0.74 ALDH1A1 (0.38) TSHR
Phosphine SCHEMBL20701190 0.74 ALDH1A1 (0.38) TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 71 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024080256-A1 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE 株式会社レゾナック 2024-04-18 WO disclosed
WO-2024080255-A1 METHOD FOR PRODUCING SEMICONDUCTOR DEVICE 株式会社レゾナック 2024-04-18 WO disclosed
US-11912889-B2 Silicon-containing polymer, film-forming composition, method for forming silicon-containing polymer coating, method for forming silica coating, and production method for silicon-containing polymer TOKYO OHKA KOGYO CO., LTD. (JP) 2024-02-27 US disclosed
US-20240064895-A1 CIRCUIT BOARD AND METHOD OF PRODUCTION THEREFOR DENKA COMPANY LIMITED (JP) 2024-02-22 US disclosed
US-11901249-B2 Curable composition and cured product thereof DIC CORPORATION (JP) 2024-02-13 US disclosed
US-11873356-B2 Curable composition and cured product thereof DIC CORPORATION (JP) 2024-01-16 US disclosed
EP-3971229-B1 SILICON-CONTAINING POLYMER, FILM-FORMING COMPOSITION, METHOD FOR FORMING SILICON-CONTAINING POLYMER COATING, METHOD FOR FORMING SILICA COATING, AND PRODUCTION METHOD FOR SILICON-CONTAINING POLYMER TOKYO OHKA KOGYO CO LTD (JP) 2024-01-03 EP disclosed
EP-4299550-A1 METHOD FOR MANUFACTURING CIRCUIT BOARD AND CIRCUIT BOARD Denka Company Limited (JP) 2024-01-03 EP disclosed
WO-2023190575-A1 CIRCUIT BOARD MANUFACTURING METHOD AND CIRCUIT BOARD デンカ株式会社 2023-10-05 WO disclosed
WO-2023074258-A1 ACTIVE ESTER COMPOUND 東洋紡株式会社 2023-05-04 WO disclosed
WO-2019176554-A1 UNDERFILL MATERIAL AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SAME デクセリアルズ株式会社 2019-09-19 WO disclosed
WO-2019163703-A1 POLYIMIDE PRECURSOR RESIN COMPOSITION JXTGエネルギー株式会社 2019-08-29 WO disclosed
US-10364372-B2 Composition and method of producing siliceous film TOKYO OHKA KOGYO CO., LTD. (JP) 2019-07-30 US disclosed
US-20180201807-A1 COMPOSITION AND METHOD OF PRODUCING SILICEOUS FILM TOKYO OHKA KOGYO CO., LTD. (JP) 2018-07-19 US disclosed
US-20180187010-A1 SILICON-CONTAINING RESIN COMPOSITION TOKYO OHKA KOGYO CO., LTD. (JP) 2018-07-05 US disclosed
EP-3318606-A1 SILICON-CONTAINING RESIN COMPOSITION Tokyo Ohka Kogyo Co., Ltd. (JP) 2018-05-09 EP disclosed
US-20130127071-A1 EPOXY RESIN COMPOSITION FOR SEMICONDUCTOR ENCAPSULATION AND SEMICONDUCTOR DEVICE USING THE SAME NITTO DENKO CORPORATION (JP) 2013-05-23 US disclosed
EP-2594596-A1 Epoxy resin composition for semiconductor encapsulation and semiconductor device using the same NITTO DENKO CORPORATION (JP) 2013-05-22 EP disclosed
US-20120153512-A1 EPOXY RESIN COMPOSITION FOR SEMICONDUCTOR ENCAPSULATION AND SEMICONDUCTOR DEVICE OBTAINED USING THE SAME NITTO DENKO CORPORATION (JP) 2012-06-21 US disclosed
JP-2012017414-A CURING ACCELERATOR FOR EPOXY RESIN AND EPOXY RESIN-BASED COMPOSITION HOKKO CHEM IND CO LTD 2012-01-26 JP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20180187010-A1 SILICON-CONTAINING RESIN COMPOSITION CROCC, SRI, SEM1 TSHR 4701/4885TRPA1 1599/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.