SCHEMBL20691779

SCHEMBL20691779

CCC(I)C(=O)OCC1CC2CC(CC(O)(C(F)(F)F)C(F)(F)F)C1S2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20280580 0.83 — —
SCHEMBL18772325 0.81 — —
SCHEMBL18457350 0.79 ALDH1A1 (0.38) —
SCHEMBL20215472 0.79 — —
SCHEMBL20691774 0.73 — —
SCHEMBL19335843 0.70 — —
SCHEMBL21281795 0.68 ALDH1A1 (0.37) —
SCHEMBL19457779 0.68 — —
SCHEMBL18476620 0.68 HTT (0.35) —
SCHEMBL18893324 0.67 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20190033716-A1 SULFONIUM SALT, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-01-31 — — US disclosed
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