SCHEMBL20691774

SCHEMBL20691774

CCC(I)C(=O)OCC1CCCC(CC(O)(C(F)(F)F)C(F)(F)F)C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18457346 0.80 — —
SCHEMBL18714083 0.78 ALDH1A1 (0.40) —
SCHEMBL23974059 0.77 ALDH1A1 (0.32) —
SCHEMBL18772325 0.77 — —
SCHEMBL20691808 0.76 LMNA (0.46) —
SCHEMBL20215472 0.75 — —
SCHEMBL12968008 0.74 — —
SCHEMBL20691779 0.73 — —
SCHEMBL18476620 0.71 HTT (0.35) —
SCHEMBL19335843 0.68 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20190033716-A1 SULFONIUM SALT, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-01-31 — — US disclosed
Send feedback