Known targets — ChEMBL curated mechanism
MMP1MMP13MMP7MMP8polrplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Alcohol. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrogen Sulfide SCHEMBL27518477 | 0.85 | — | — | |
| Bromide SCHEMBL4988084 | 0.85 | — | — | |
| SCHEMBL10666861 | 0.85 | — | — | |
| Water SCHEMBL9764760 | 0.85 | — | — | |
| Hydrochloric Acid SCHEMBL7267735 | 0.85 | — | — | |
| Propionic Acid SCHEMBL28145780 | 0.83 | ALDH1A1 (0.44) | — | |
| Methylamine SCHEMBL475740 | 0.82 | — | — | |
| Hydrochloric Acid SCHEMBL6307325 | 0.82 | — | — | |
| Hydrochloric Acid SCHEMBL20767879 | 0.82 | — | — | |
| Benzene SCHEMBL7901950 | 0.82 | PDPK1 (0.44) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11820742-B2 | Fluorine-containing ether compound, lubricant for magnetic recording medium, and magnetic recording medium | RESONAC CORPORATION (JP) | 2023-11-21 | — | — | US | disclosed |
| US-20230099918-A1 | FLUORINE-CONTAINING ETHER COMPOUND, LUBRICANT FOR MAGNETIC RECORDING MEDIUM, AND MAGNETIC RECORDING MEDIUM | SHOWA DENKO K.K. (JP) | 2023-03-30 | — | — | US | disclosed |
| US-11427779-B2 | Fluorine-containing ether compound, lubricant for magnetic recording medium, and magnetic recording medium | SHOWA DENKO K.K. (JP) | 2022-08-30 | — | — | US | disclosed |
| US-11279664-B2 | Fluorine-containing ether compound, lubricant for magnetic recording medium, and magnetic recording medium | SHOWA DENKO K.K. (JP) | 2022-03-22 | — | — | US | disclosed |
| US-11180457-B2 | Fluorine-containing ether compound, lubricant for magnetic recording medium, and magnetic recording medium | SHOWA DENKO K. K. (JP) | 2021-11-23 | — | — | US | disclosed |
| WO-2021131993-A1 | FLUORINE-CONTAINING ETHER COMPOUND, LUBRICANT FOR MAGNETIC RECORDING MEDIUM, AND MAGNETIC RECORDING MEDIUM | 昭和電工株式会社 | 2021-07-01 | — | — | WO | disclosed |
| US-20200283392-A1 | FLUORINE-CONTAINING ETHER COMPOUND, LUBRICANT FOR MAGNETIC RECORDING MEDIUM, AND MAGNETIC RECORDING MEDIUM | SHOWA DENKO K.K. (JP) | 2020-09-10 | — | — | US | disclosed |
| US-20190084911-A1 | FLUORINE-CONTAINING ETHER COMPOUND, LUBRICANT FOR MAGNETIC RECORDING MEDIUM, AND MAGNETIC RECORDING MEDIUM | SHOWA DENKO K.K. (JP) | 2019-03-21 | — | — | US | disclosed |