SCHEMBL20838481

SCHEMBL20838481

CCCCCCC(=O)OC(=O)C(C)CCCC

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 4/20 0.55
MAPT P10636 2/20 0.54
DGKA P23743 1/20 0.53
PAM P19021 2/20 0.49
TSHR P16473 2/20 0.49
ALDH1A1 P00352 1/20 0.49
CYP3A4 P08684 1/20 0.49
ATM Q13315 1/20 0.49
TDP1 Q9NUW8 1/20 0.49
KDM4E B2RXH2 1/20 0.47
DUSP3 P51452 1/20 0.47
MEN1 O00255 1/20 0.47
KMT2A Q03164 1/20 0.47
MAPK1 P28482 1/20 0.47
PRKCA P17252 1/20 0.45
PRKCE Q02156 1/20 0.45
PRKCQ Q04759 1/20 0.45
PRKCD Q05655 1/20 0.45
DNM1 Q05193 1/20 0.45
FFAR4 Q5NUL3 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27749470 1.00 LMNA (0.55) LMNAMAPTDGKAPAMTSHR
SCHEMBL1739771 0.98 LMNA (0.52) LMNAMAPTDGKAPAMTSHR
SCHEMBL27528747 0.96 LMNA (0.55) LMNAMAPTDGKAPAMTSHR
SCHEMBL1740008 0.96 LMNA (0.55) LMNAMAPTDGKAPAMTSHR
SCHEMBL27321448 0.96 LMNA (0.55) LMNAMAPTDGKAPAMTSHR
SCHEMBL15754146 0.96 LMNA (0.55) LMNAMAPTDGKAPAMTSHR
SCHEMBL28318008 0.92 LMNA (0.50) LMNAMAPTDGKAPAMTSHR
SCHEMBL4752094 0.91 LMNA (0.52) LMNAMAPTDGKAPAMTSHR
SCHEMBL28189025 0.89 ALDH1A1 (0.52) LMNAMAPTDGKAPAMTSHR
SCHEMBL9122442 0.87 LMNA (0.56) LMNAMAPTDGKAPAMTSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11162057-B2 Composition for surface treatment, method for producing composition for surface treatment, surface treatment method, and method for producing semiconductor substrate FUJIMI INCORPORATED 2021-11-02 US disclosed
US-20190093056-A1 COMPOSITION FOR SURFACE TREATMENT, METHOD FOR PRODUCING COMPOSITION FOR SURFACE TREATMENT, SURFACE TREATMENT METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE FUJIMI INCORPORATED (JP) 2019-03-28 US disclosed