Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.37 |
| ▸ | MEN1 | O00255 | 3/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.37 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.37 |
| ▸ | HTT | P42858 | 2/20 | 0.37 |
| ▸ | LMNA | P02545 | 4/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 4/20 | 0.33 |
| ▸ | TSHR | P16473 | 2/20 | 0.33 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.33 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.33 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.33 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8490706 | 0.80 | ALDH1A1 (0.34) | ALDH1A1MEN1KMT2ANPSR1HTT | |
| SCHEMBL6739715 | 0.79 | ALDH1A1 (0.39) | ALDH1A1MEN1KMT2ANPSR1HTT | |
| SCHEMBL12687776 | 0.77 | ALDH1A1 (0.35) | ALDH1A1MEN1KMT2ANPSR1HTT | |
| SCHEMBL19798444 | 0.77 | NPSR1 (0.43) | ALDH1A1MEN1KMT2ANPSR1HTT | |
| SCHEMBL482480 | 0.76 | ALDH1A1 (0.41) | ALDH1A1MEN1KMT2ANPSR1HTT | |
| Ammonia Solution, Strong SCHEMBL11635039 | 0.74 | ALDH1A1 (0.41) | ALDH1A1MEN1KMT2ANPSR1HTT | |
| SCHEMBL2084363 | 0.73 | EPHX2 (0.43) | ALDH1A1MEN1KMT2ANPSR1HTT | |
| SCHEMBL5917722 | 0.73 | CA12 (0.46) | ALDH1A1MEN1KMT2ALMNA | |
| SCHEMBL15533591 | 0.72 | EPHX2 (0.45) | ALDH1A1MEN1KMT2ANPSR1HTT | |
| SCHEMBL25753188 | 0.72 | EPHX2 (0.45) | ALDH1A1MEN1KMT2ANPSR1HTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 52 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-106019830-B | Resist composition and method for producing resist pattern | 住友化学株式会社 | 2021-08-20 | — | — | CN | claimed |
| US-20150301452-A1 | PHOTORESIST COMPOSITION AND METHOD OF FABRICATING DISPLAY SUBSTRATE USING THE SAME | SAMSUNG DISPLAY CO., LTD. (KR) | 2015-10-22 | — | — | US | claimed |
| CN-118011733-A | Positive photosensitive resin composition, resist film, resist underlayer film, and resist permanent film | DIC株式会社 | 2024-05-10 | — | — | CN | disclosed |
| CN-106019830-B | Resist composition and method for producing resist pattern | 住友化学株式会社 | 2021-08-20 | — | — | CN | disclosed |
| CN-107207456-B | Latent acids and their use | 巴斯夫欧洲公司 | 2021-05-04 | — | — | CN | disclosed |
| US-9946157-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-04-17 | — | — | US | disclosed |
| US-20160291464-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-10-06 | — | — | US | disclosed |
| US-20150301452-A1 | PHOTORESIST COMPOSITION AND METHOD OF FABRICATING DISPLAY SUBSTRATE USING THE SAME | SAMSUNG DISPLAY CO., LTD. (KR) | 2015-10-22 | — | — | US | disclosed |
| US-8431325-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-04-30 | — | — | US | disclosed |
| US-7972763-B2 | Patterns having high resolution; used for semiconductor microfabrication employing a lithography | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-07-05 | — | — | US | disclosed |
| US-20110053086-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY,LIMITED (JP) | 2011-03-03 | — | — | US | disclosed |
| US-20020187421-A1 | Method of producing photoresist | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-12-12 | — | — | US | disclosed |
| US-20020164540-A1 | Chemical amplifying type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-11-07 | — | — | US | disclosed |
| US-20020155376-A1 | Mixture of radiation sensive compound and binder; fluoropolymers | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 2002-10-24 | — | — | US | disclosed |
| US-20020081524-A1 | Chemical amplifying type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-06-27 | — | — | US | disclosed |
| US-20020012874-A1 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-01-31 | — | — | US | disclosed |
| US-20010016298-A1 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-08-23 | — | — | US | disclosed |
| EP-1122604-A2 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-08-08 | — | — | EP | disclosed |
| EP-0856773-B1 | Chemical amplification type positive resist composition | SUMITOMO CHEMICAL CO (JP) | 2001-06-13 | — | — | EP | disclosed |
| EP-0856773-A1 | Chemical amplification type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1998-08-05 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110053086-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | OR10J3, C1R, C9 | ALDH1A1 2546/4885MEN1 4120/4885KMT2A 1336/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.