SCHEMBL20872336

SCHEMBL20872336

CCCCCC(CC[Si](OC)(OC)OC)Nc1ccccc1

nearest known ligand 0.36

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
▸ KCNH2 Q12809 2/20 0.36
▸ SIGMAR1 Q99720 4/20 0.35
▸ EPHX1 P07099 3/20 0.35
▸ ALDH1A1 P00352 1/20 0.35
▸ HTT P42858 1/20 0.35
▸ KCNH3 Q9ULD8 1/20 0.35
▸ HDAC8 Q9BY41 5/20 0.34
▸ HDAC3 O15379 3/20 0.34
▸ HDAC6 Q9UBN7 3/20 0.34
▸ CACNA2D1 P54289 2/20 0.34
▸ HDAC1 Q13547 2/20 0.34
▸ HDAC2 Q92769 2/20 0.34
▸ CNR2 P34972 1/20 0.34
▸ HDAC4 P56524 1/20 0.34
▸ HDAC7 Q8WUI4 1/20 0.34
▸ HDAC10 Q969S8 1/20 0.34
▸ HDAC11 Q96DB2 1/20 0.34
▸ HDAC9 Q9UKV0 1/20 0.34
▸ HDAC5 Q9UQL6 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18896255 0.84 TDP1 (0.45) KCNH2EPHX1ALDH1A1HTTKCNH3
SCHEMBL5875341 0.83 HDAC8 (0.44) EPHX1ALDH1A1HTTHDAC8HDAC3
SCHEMBL4688472 0.83 HDAC8 (0.44) EPHX1ALDH1A1HTTHDAC8HDAC3
SCHEMBL19271855 0.83 HDAC8 (0.44) EPHX1ALDH1A1HTTHDAC8HDAC3
SCHEMBL25124425 0.83 ENPP2 (0.43) KCNH2EPHX1ALDH1A1HTTKCNH3
SCHEMBL23861793 0.83 HDAC8 (0.44) EPHX1ALDH1A1HTTHDAC8HDAC3
SCHEMBL20987622 0.83 HDAC8 (0.44) EPHX1ALDH1A1HTTHDAC8HDAC3
SCHEMBL21499101 0.83 HDAC8 (0.44) EPHX1ALDH1A1HTTHDAC8HDAC3
SCHEMBL28681232 0.83 HDAC8 (0.44) EPHX1ALDH1A1HTTHDAC8HDAC3
SCHEMBL5130052 0.82 ALDH1A1 (0.35) ALDH1A1HTTKCNH3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114806145-B Resin composition 味之素株式会社 2025-05-02 — — CN claimed
CN-114806145-B Resin composition 味之素株式会社 2025-05-02 — — CN disclosed
WO-2025089080-A1 RESIN COMPOSITION, HEAT DISSIPATION DEVICE, AND ELECTRONIC DEVICE AGC株式会社 2025-05-01 — — WO disclosed
CN-119585335-A Resin composition 味之素株式会社 2025-03-07 — — CN disclosed
US-20250022829-A1 UNDERFILL MATERIAL AJINOMOTO CO., INC. (JP) 2025-01-16 — — US disclosed
EP-4475179-A1 UNDERFILL MATERIAL AJINOMOTO CO., INC. (JP) 2024-12-11 — — EP disclosed
CN-110018613-B Resin composition 味之素株式会社 2024-11-05 — — CN disclosed
CN-118648100-A Underfill material 味之素株式会社 2024-09-13 — — CN disclosed
CN-110035622-B Method for manufacturing printed wiring board 味之素株式会社 2024-09-10 — — CN disclosed
CN-118496658-A Resin sheet 味之素株式会社 2024-08-16 — — CN disclosed
WO-2023149210-A1 UNDERFILL MATERIAL 味の素株式会社 2023-08-10 — — WO disclosed
CN-116540492-A Photosensitive resin composition 味之素株式会社 2023-08-04 — — CN disclosed
CN-109233212-B Resin composition 味之素株式会社 2023-03-31 — — CN disclosed
CN-114806145-A Resin composition 味之素株式会社 2022-07-29 — — CN disclosed
CN-108624218-B Resin composition 味之素株式会社 2022-03-29 — — CN disclosed
US-10808103-B2 Resin composition, laminate including the resin composition, semiconductor wafer with resin composition layer, substrate for mounting semiconductor with resin composition layer, and semiconductor device including the semiconductor wafer with resin composition layer MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2020-10-20 — — US disclosed
EP-3466992-B1 RESIN COMPOSITION, LAMINATE, SEMICONDUCTOR WAFER WITH RESIN COMPOSITION LAYER, SUBSTRATE FOR MOUNTING SEMICONDUCTOR WITH RESIN COMPOSITION LAYER, AND SEMICONDUCTOR DEVICE MITSUBISHI GAS CHEMICAL CO (JP) 2020-07-08 — — EP disclosed
CN-111349314-A Resin composition 味之素株式会社 2020-06-30 — — CN disclosed
US-20190300678-A1 RESIN COMPOSITION, LAMINATE, SEMICONDUCTOR WAFER WITH RESIN COMPOSITION LAYER, SUBSTRATE FOR MOUNTING SEMICONDUCTOR WITH RESIN COMPOSITION LAYER, AND SEMICONDUCTOR DEVICE MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2019-10-03 — — US disclosed
EP-3466992-A1 RESIN COMPOSITION, LAMINATE, SEMICONDUCTOR WAFER WITH RESIN COMPOSITION LAYER, SUBSTRATE FOR MOUNTING SEMICONDUCTOR WITH RESIN COMPOSITION LAYER, AND SEMICONDUCTOR DEVICE Mitsubishi Gas Chemical Company, Inc. (JP) 2019-04-10 — — EP disclosed
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