Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC2A1 | P11166 | 3/20 | 0.46 |
| ▸ | SQSTM1 | Q13501 | 3/20 | 0.41 |
| ▸ | KEAP1 | Q14145 | 3/20 | 0.41 |
| ▸ | NFE2L2 | Q16236 | 3/20 | 0.41 |
| ▸ | PTPN11 | Q06124 | 1/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.38 |
| ▸ | GAA | P10253 | 1/20 | 0.38 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.38 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.38 |
| ▸ | S1PR3 | Q99500 | 1/20 | 0.38 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.38 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.38 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.38 |
| ▸ | TSHR | P16473 | 2/20 | 0.38 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.38 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.38 |
| ▸ | PTPRA | P18433 | 1/20 | 0.38 |
| ▸ | PTPRB | P23467 | 1/20 | 0.38 |
| ▸ | RAPGEF4 | Q8WZA2 | 1/20 | 0.38 |
| ▸ | CDK1 | P06493 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5148165 | 0.95 | S1PR3 (0.40) | SLC2A1PTPN11TDP1GAAS1PR3 | |
| SCHEMBL12627607 | 0.87 | S1PR3 (0.47) | SLC2A1TDP1GAAMAPK1L3MBTL1 | |
| SCHEMBL9589463 | 0.84 | SQSTM1 (0.41) | SLC2A1SQSTM1KEAP1NFE2L2TDP1 | |
| SCHEMBL2858146 | 0.84 | S1PR3 (0.54) | SLC2A1PTPN11S1PR3TSHRALDH1A1 | |
| SCHEMBL2853589 | 0.83 | S1PR3 (0.53) | SLC2A1PTPN11S1PR3TSHRALDH1A1 | |
| SCHEMBL30043696 | 0.83 | GAA (0.40) | SLC2A1SQSTM1KEAP1NFE2L2TDP1 | |
| SCHEMBL601854 | 0.83 | GAA (0.40) | SLC2A1SQSTM1KEAP1NFE2L2TDP1 | |
| SCHEMBL29432545 | 0.82 | ALDH1A1 (0.52) | SLC2A1SQSTM1KEAP1NFE2L2TDP1 | |
| SCHEMBL29868203 | 0.82 | ALDH1A1 (0.52) | SLC2A1SQSTM1KEAP1NFE2L2TDP1 | |
| SCHEMBL601324 | 0.82 | ALDH1A1 (0.52) | SLC2A1SQSTM1KEAP1NFE2L2TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 61 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5250385-A | Photosensitivity, storage stability | FUJI PHOTO FILM CO., LTD. (JP) | 1993-10-05 | — | — | US | claimed |
| US-5202216-A | Containing water insoluble polymer and aromatic sulfonic acid salt of an onium compound | FUJI PHOTO FILM CO., LTD. (JP) | 1993-04-13 | — | — | US | claimed |
| US-20240085785-A1 | ADDITIVES FOR METAL OXIDE PHOTORESISTS, POSITIVE TONE DEVELOPMENT WITH ADDITIVES, AND DOUBLE BAKE DOUBLE DEVELOP PROCESSING | JSR CORPORATION (JP) | 2024-03-14 | — | — | US | disclosed |
| WO-2024039626-A1 | ADDITIVES FOR METAL OXIDE PHOTORESISTS, POSITIVE TONE DEVELOPMENT WITH ADDITIVES, AND DOUBLE BAKE DOUBLE DEVELOP PROCESSING | INPRIA CORPORATION (US) | 2024-02-22 | — | — | WO | disclosed |
| US-9881745-B2 | Dye sensitized solar cell | ADEKA CORPORATION (JP) | 2018-01-30 | — | — | US | disclosed |
| US-9519216-B2 | Positive photosensitive resin compositions | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2016-12-13 | — | — | US | disclosed |
| US-9519216-B2 | Positive photosensitive resin compositions | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2016-12-13 | — | — | US | disclosed |
| EP-3041008-A1 | DYE-SENSITIZED SOLAR CELL | Adeka Corporation (JP) | 2016-07-06 | — | — | EP | disclosed |
| US-20160148758-A1 | DYE SENSITIZED SOLAR CELL | ADEKA CORPORATION (JP) | 2016-05-26 | — | — | US | disclosed |
| CN-105340037-A | Dye-sensitized solar cell | ADEKA CORP | 2016-02-17 | — | — | CN | disclosed |
| US-9239408-B2 | Colored photosensitive composition | ADEKA CORPORATION (JP) | 2016-01-19 | — | — | US | disclosed |
| CN-1235141-A | Process for preparing organic compound | MITSUI CHEMICALS INC (JP) | 1999-11-17 | — | — | CN | disclosed |
| EP-0950649-A1 | A process for preparing oxyalkylene derivatives in the presence of phosphine oxides | Mitsui Chemicals, Inc. (JP) | 1999-10-20 | — | — | EP | disclosed |
| US-5965319-A | COMPRISES A AN ONIUM SALT COMPOUND E.G. DIAZONIUM SULFONATE, A CROSSLINKING AGENT CROSSLINKABLE BY AN ACID, A POLYMER COMPOUND HAVING AN ALKALINE-SOLUBLE GROUP, AND AN INFRARED RAY ABSORBING AGENT; LITHOGRAPHY; FORM PLATES; STORAGE STABILITY; | FUJI PHOTO FILM CO., LTD. (JP) | 1999-10-12 | — | — | US | disclosed |
| EP-0919868-A1 | Positive type image forming material | FUJI PHOTO FILM CO., LTD. (JP) | 1999-06-02 | — | — | EP | disclosed |
| EP-0914964-A2 | Positive type photosensitive composition for infrared lasers | FUJI PHOTO FILM CO., LTD. (JP) | 1999-05-12 | — | — | EP | disclosed |
| EP-0899614-A1 | Image recording material | Fuji Photo Film Co., Ltd. (JP) | 1999-03-03 | — | — | EP | disclosed |
| US-5370965-A | Storage stable, forms clear images | FUJI PHOTO FILM CO., LTD. (JP) | 1994-12-06 | — | — | US | disclosed |
| US-5250385-A | Photosensitivity, storage stability | FUJI PHOTO FILM CO., LTD. (JP) | 1993-10-05 | — | — | US | disclosed |
| US-5202216-A | Containing water insoluble polymer and aromatic sulfonic acid salt of an onium compound | FUJI PHOTO FILM CO., LTD. (JP) | 1993-04-13 | — | — | US | disclosed |