SCHEMBL20912440

SCHEMBL20912440

O=C(O)CCCCOC(=O)c1cccs1

nearest known ligand 0.62

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HPGD P15428 5/20 0.62
NPC1 O15118 8/20 0.55
RAB9A P51151 7/20 0.54
LMNA P02545 4/20 0.54
ALDH1A1 P00352 6/20 0.52
KMT2A Q03164 3/20 0.52
MEN1 O00255 2/20 0.52
GLA P06280 1/20 0.52
BRCA1 P38398 1/20 0.52
POLB P06746 1/20 0.47
NFKB1 P19838 2/20 0.47
NFKB2 Q00653 2/20 0.47
RELA Q04206 2/20 0.47
SMN1; SMN2 Q16637 2/20 0.47
TP53 P04637 1/20 0.47
TDP1 Q9NUW8 1/20 0.46
MAPT P10636 2/20 0.46
DAO P14920 1/20 0.46
TSHR P16473 1/20 0.45
MAPK1 P28482 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20912328 0.89 NPC1 (0.58) HPGDNPC1RAB9ALMNAALDH1A1
SCHEMBL25676025 0.83 ALDH1A1 (0.54) HPGDNPC1RAB9ALMNAALDH1A1
SCHEMBL9494112 0.83 TSHR (0.58) HPGDNPC1RAB9ALMNAALDH1A1
SCHEMBL27782199 0.83 ALDH1A1 (0.54) HPGDNPC1RAB9ALMNAALDH1A1
SCHEMBL23113684 0.81 ALDH1A1 (0.59) HPGDNPC1RAB9ALMNAALDH1A1
SCHEMBL28046865 0.81 ALDH1A1 (0.59) HPGDNPC1RAB9ALMNAALDH1A1
SCHEMBL30526531 0.81 ALDH1A1 (0.59) HPGDNPC1RAB9ALMNAALDH1A1
SCHEMBL5935760 0.81 ALDH1A1 (0.59) HPGDNPC1RAB9ALMNAALDH1A1
SCHEMBL23598360 0.81 ALDH1A1 (0.59) HPGDNPC1RAB9ALMNAALDH1A1
SCHEMBL9499276 0.81 KMT2A (0.62) HPGDNPC1RAB9ALMNAALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11269251-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-03-08 US disclosed
US-20190113844-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-04-18 US disclosed