SCHEMBL2102008

SCHEMBL2102008

C[Si](C)(C)C[Si](Cl)(Cl)C[Si](C)(C)C

nearest known ligand 0.39

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL996306 0.75
SCHEMBL2686967 0.75
SCHEMBL28963063 0.75 ALDH1A1 (0.39) ALDH1A1
SCHEMBL2463466 0.75 ALDH1A1 (0.39) ALDH1A1
SCHEMBL996456 0.75
SCHEMBL9392907 0.75 ALDH1A1 (0.39) ALDH1A1
SCHEMBL85727 0.71
Iodide SCHEMBL25276934 0.67
SCHEMBL8167773 0.67
SCHEMBL8736863 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116120360-A Silyl ether connected furyl dialdehyde compound and preparation method thereof 中国科学技术大学 2023-05-16 CN disclosed
US-8164166-B2 Interfacial roughness reducing film, wiring layer, semiconductor device, and method of manufacturing semiconductor device FUJITSU LIMITED (JP) 2012-04-24 US disclosed
US-20090085170-A1 INTERFACIAL ROUGHNESS REDUCING FILM, WIRING LAYER, SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2009-04-02 US disclosed
US-5302734-A Pyrolysis of alkoxytrisilaalkanes KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 1994-04-12 US disclosed
US-5138080-A One step;dechlorinating mixture of chlorosilaalkane and organochlorosilane KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 1992-08-11 US disclosed
US-5075477-A Direct synthesis of methylchlorosilaakanes KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 1991-12-24 US disclosed