SCHEMBL2102317

SCHEMBL2102317

CCNC([SiH3])=C(Cl)NCC

nearest known ligand 0.36

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
KDM4A O75164 1/20 0.36
ALDH1A1 P00352 1/20 0.35
CYP3A4 P08684 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2101790 0.80
SCHEMBL11612024 0.73
SCHEMBL2267214 0.72 ALDH1A1 (0.31) ALDH1A1CYP3A4
SCHEMBL233761 0.71 KMT2A (0.40) KDM4AALDH1A1CYP3A4
SCHEMBL2273312 0.69
SCHEMBL2102319 0.69 KMT2A (0.39) KDM4AALDH1A1CYP3A4
SCHEMBL2269729 0.65 ALDH1A1 (0.33) ALDH1A1CYP3A4
SCHEMBL19905662 0.65
SCHEMBL23644197 0.63 ALDH1A1 (0.32) ALDH1A1CYP3A4
SCHEMBL21737741 0.63

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8404584-B2 Method of manufacturing semiconductor device FUJITSU LIMITED (JP) 2013-03-26 US disclosed
US-8164166-B2 Interfacial roughness reducing film, wiring layer, semiconductor device, and method of manufacturing semiconductor device FUJITSU LIMITED (JP) 2012-04-24 US disclosed
US-20110207319-A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2011-08-25 US disclosed
US-20090085170-A1 INTERFACIAL ROUGHNESS REDUCING FILM, WIRING LAYER, SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2009-04-02 US disclosed