Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.36 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.36 |
| ▸ | HTT | P42858 | 1/20 | 0.32 |
| ▸ | KDM4A | O75164 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL233761 | 0.73 | KMT2A (0.40) | KMT2AALDH1A1CYP3A4HTTKDM4A | |
| SCHEMBL2101790 | 0.71 | — | — | |
| SCHEMBL2102317 | 0.69 | KDM4A (0.36) | ALDH1A1CYP3A4KDM4A | |
| SCHEMBL2273368 | 0.67 | KMT2A (0.36) | KMT2AALDH1A1CYP3A4HTT | |
| SCHEMBL2101593 | 0.67 | KMT2A (0.36) | KMT2AALDH1A1CYP3A4HTT | |
| SCHEMBL232562 | 0.67 | KMT2A (0.46) | KMT2AALDH1A1CYP3A4HTTKDM4A | |
| SCHEMBL2102787 | 0.65 | — | — | |
| SCHEMBL7737797 | 0.65 | — | — | |
| SCHEMBL2275764 | 0.64 | KMT2A (0.33) | KMT2AALDH1A1CYP3A4 | |
| SCHEMBL2267214 | 0.64 | ALDH1A1 (0.31) | ALDH1A1CYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8404584-B2 | Method of manufacturing semiconductor device | FUJITSU LIMITED (JP) | 2013-03-26 | — | — | US | disclosed |
| US-8164166-B2 | Interfacial roughness reducing film, wiring layer, semiconductor device, and method of manufacturing semiconductor device | FUJITSU LIMITED (JP) | 2012-04-24 | — | — | US | disclosed |
| US-20110207319-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2011-08-25 | — | — | US | disclosed |
| US-20090085170-A1 | INTERFACIAL ROUGHNESS REDUCING FILM, WIRING LAYER, SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2009-04-02 | — | — | US | disclosed |