Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 4/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.35 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL236457 | 0.88 | TSHR (0.38) | TSHRALDH1A1EPHX1LMNATHRB | |
| SCHEMBL2101081 | 0.83 | TSHR (0.35) | TSHRALDH1A1EPHX1LMNATHRB | |
| SCHEMBL2099756 | 0.82 | — | — | |
| SCHEMBL2101198 | 0.76 | TSHR (0.38) | TSHRALDH1A1EPHX1LMNA | |
| SCHEMBL235324 | 0.75 | — | — | |
| SCHEMBL2272202 | 0.72 | EPHX1 (0.32) | TSHREPHX1LMNATHRB | |
| SCHEMBL15309856 | 0.72 | EPHX1 (0.32) | TSHREPHX1LMNATHRB | |
| SCHEMBL233647 | 0.71 | TSHR (0.35) | TSHRALDH1A1EPHX1LMNATHRB | |
| SCHEMBL2269940 | 0.71 | TSHR (0.35) | TSHRALDH1A1EPHX1LMNATHRB | |
| SCHEMBL2269857 | 0.70 | EPHX1 (0.31) | TSHREPHX1LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8404584-B2 | Method of manufacturing semiconductor device | FUJITSU LIMITED (JP) | 2013-03-26 | — | — | US | disclosed |
| US-8164166-B2 | Interfacial roughness reducing film, wiring layer, semiconductor device, and method of manufacturing semiconductor device | FUJITSU LIMITED (JP) | 2012-04-24 | — | — | US | disclosed |
| US-20110207319-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2011-08-25 | — | — | US | disclosed |
| US-20090085170-A1 | INTERFACIAL ROUGHNESS REDUCING FILM, WIRING LAYER, SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2009-04-02 | — | — | US | disclosed |