SCHEMBL2103441

SCHEMBL2103441

CN[SiH](CCCN(C)C)NC

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.43
TSHR P16473 1/20 0.43
PRMT3 O60678 1/20 0.38
CARM1 Q86X55 1/20 0.38
PRMT6 Q96LA8 1/20 0.38
PRMT1 Q99873 1/20 0.38
PRMT8 Q9NR22 1/20 0.38
DNM1 Q05193 3/20 0.36
TDP1 Q9NUW8 3/20 0.34
HRH4 Q9H3N8 2/20 0.32
CYP1A2 P05177 1/20 0.32
HRH2 P25021 1/20 0.32
CYP2C9 P11712 1/20 0.32
CYP2C19 P33261 1/20 0.32
HSD17B10 Q99714 1/20 0.31
CA12 O43570 1/20 0.30
CA2 P00918 1/20 0.30
CA3 P07451 1/20 0.30
CA4 P22748 1/20 0.30
CA6 P23280 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL234934 0.83 PRMT3 (0.41) ALDH1A1TSHRPRMT3CARM1PRMT6
SCHEMBL2101921 0.75 PAOX (0.32) ALDH1A1
SCHEMBL2103909 0.75 ALDH1A1 (0.39) ALDH1A1TSHRDNM1TDP1HRH4
SCHEMBL2100383 0.70 ALDH1A1 (0.35) ALDH1A1TSHRPRMT3CARM1PRMT6
SCHEMBL16750965 0.69
SCHEMBL2101150 0.69
SCHEMBL23282508 0.67
SCHEMBL2103642 0.67
SCHEMBL2102305 0.67
SCHEMBL2103104 0.67 ALDH1A1 (0.47) ALDH1A1TSHRDNM1TDP1HRH4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8404584-B2 Method of manufacturing semiconductor device FUJITSU LIMITED (JP) 2013-03-26 US disclosed
US-8164166-B2 Interfacial roughness reducing film, wiring layer, semiconductor device, and method of manufacturing semiconductor device FUJITSU LIMITED (JP) 2012-04-24 US disclosed
US-20110207319-A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2011-08-25 US disclosed
US-20090085170-A1 INTERFACIAL ROUGHNESS REDUCING FILM, WIRING LAYER, SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2009-04-02 US disclosed