Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 1/20 | 0.34 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.33 |
| ▸ | TSHR | P16473 | 3/20 | 0.33 |
| ▸ | KCNN4 | O15554 | 1/20 | 0.33 |
| ▸ | CKS1B | P61024 | 1/20 | 0.32 |
| ▸ | SKP1 | P63208 | 1/20 | 0.32 |
| ▸ | SKP2 | Q13309 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | HTT | P42858 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | HTR2A | P28223 | 1/20 | 0.31 |
| ▸ | HRH1 | P35367 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | AOC3 | Q16853 | 1/20 | 0.31 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.31 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.31 |
| ▸ | OPRL1 | P41146 | 1/20 | 0.31 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2100521 | 0.79 | ESR1 (0.34) | ESR1ESR2ALDH1A1TSHRKCNN4 | |
| SCHEMBL55438 | 0.79 | ESR1 (0.34) | ESR1ESR2ALDH1A1TSHRKCNN4 | |
| SCHEMBL2100797 | 0.77 | ESR1 (0.38) | ESR1ESR2ALDH1A1TSHRKCNN4 | |
| SCHEMBL1203911 | 0.76 | ESR1 (0.41) | ESR1ESR2ALDH1A1TSHRKCNN4 | |
| SCHEMBL2100486 | 0.73 | TSHR (0.33) | ESR1ESR2ALDH1A1TSHRMAPT | |
| SCHEMBL765973 | 0.72 | MEN1 (0.40) | ESR1ESR2ALDH1A1TSHRKCNN4 | |
| SCHEMBL2276954 | 0.72 | ESR1 (0.37) | ESR1ESR2ALDH1A1TSHRKCNN4 | |
| SCHEMBL435723 | 0.72 | ESR1 (0.37) | ESR1ESR2ALDH1A1TSHRKCNN4 | |
| SCHEMBL2102482 | 0.72 | TSHR (0.32) | ESR1ESR2TSHRLMNA | |
| SCHEMBL2100880 | 0.72 | AOC3 (0.32) | ESR1ESR2ALDH1A1HTR2AHRH1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9323151-B2 | Photosensitive oligomer for photosensitive resist, method for preparing the same, and negative photosensitive resist resin composition | BOE TECHNOLOGY GROUP CO., LTD. (CN) | 2016-04-26 | — | — | US | claimed |
| US-20150153645-A1 | PHOTOSENSITIVE OLIGOMER FOR PHOTOSENSITIVE RESIST, METHOD FOR PREPARING THE SAME, AND NEGATIVE PHOTOSENSITIVE RESIST RESIN COMPOSITION | BOE TECHNOLOGY GROUP CO., LTD. (CN) | 2015-06-04 | — | — | US | claimed |
| US-9512242-B2 | Polymerizable oligomer and photoresist composition comprising the same | BOE TECHNOLOGY GROUP CO., LTD. (CN) | 2016-12-06 | — | — | US | disclosed |
| US-20160137758-A1 | POLYMERIZABLE OLIGOMER AND PHOTORESIST COMPOSITION COMPRISING THE SAME | BOE TECHNOLOGY GROUP CO., LTD. (CN) | 2016-05-19 | — | — | US | disclosed |
| US-9323151-B2 | Photosensitive oligomer for photosensitive resist, method for preparing the same, and negative photosensitive resist resin composition | BOE TECHNOLOGY GROUP CO., LTD. (CN) | 2016-04-26 | — | — | US | disclosed |
| US-20150153645-A1 | PHOTOSENSITIVE OLIGOMER FOR PHOTOSENSITIVE RESIST, METHOD FOR PREPARING THE SAME, AND NEGATIVE PHOTOSENSITIVE RESIST RESIN COMPOSITION | BOE TECHNOLOGY GROUP CO., LTD. (CN) | 2015-06-04 | — | — | US | disclosed |
| US-8404584-B2 | Method of manufacturing semiconductor device | FUJITSU LIMITED (JP) | 2013-03-26 | — | — | US | disclosed |
| US-8164166-B2 | Interfacial roughness reducing film, wiring layer, semiconductor device, and method of manufacturing semiconductor device | FUJITSU LIMITED (JP) | 2012-04-24 | — | — | US | disclosed |
| US-20110207319-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2011-08-25 | — | — | US | disclosed |
| US-20090085170-A1 | INTERFACIAL ROUGHNESS REDUCING FILM, WIRING LAYER, SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2009-04-02 | — | — | US | disclosed |