SCHEMBL21064210

SCHEMBL21064210

CC(C)(c1ccc[nH]1)c1ccc(C(C)(C)c2ccc[nH]2)[nH]1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18660793 0.87 — —
SCHEMBL16361431 0.78 RORC (0.30) —
SCHEMBL18392176 0.76 — —
SCHEMBL796518 0.75 — —
SCHEMBL21064192 0.74 — —
SCHEMBL23467435 0.74 HMBS (0.37) —
SCHEMBL11545142 0.73 — —
SCHEMBL10830318 0.71 — —
SCHEMBL7445351 0.71 — —
SCHEMBL23185901 0.71 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10310375-B2 Photoacid generators and lithographic resists comprising the same UNIV OF NORTH CAROLINA AT CHARLOTTE (US) 2019-06-04 — — US disclosed
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