⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2137799 | 1.00 | — | — | |
| Water SCHEMBL5161689 | 0.94 | — | — | |
| SCHEMBL6704187 | 0.86 | — | — | |
| SCHEMBL10457716 | 0.86 | — | — | |
| SCHEMBL221506 | 0.86 | — | — | |
| SCHEMBL3914625 | 0.86 | — | — | |
| SCHEMBL322421 | 0.86 | — | — | |
| SCHEMBL21646130 | 0.86 | — | — | |
| SCHEMBL982831 | 0.86 | — | — | |
| Silver SCHEMBL4167944 | 0.86 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12325844-B2 | Photoresist remover | VERSUM MATERIALS US, LLC (US) | 2025-06-10 | — | — | US | claimed |
| US-20220333044-A1 | Photoresist Remover | VERSUM MATERIALS US, LLC (US) | 2022-10-20 | — | — | US | claimed |
| EP-4038173-A1 | PHOTORESIST REMOVER | Versum Materials US, LLC (US) | 2022-08-10 | — | — | EP | claimed |
| CN-114502708-A | Photoresist remover | 弗萨姆材料美国有限责任公司 | 2022-05-13 | — | — | CN | claimed |
| WO-2021067147-A1 | PHOTORESIST REMOVER | VERSUM MATERIALS US, LLC (US) | 2021-04-08 | — | — | WO | claimed |
| US-20190196337-A1 | Photoresist Stripper | VERSUM MATERIALS US, LLC (US) | 2019-06-27 | — | — | US | claimed |
| EP-3502225-A1 | PHOTORESIST STRIPPER | Versum Materials US, LLC (US) | 2019-06-26 | — | — | EP | claimed |
| EP-4646097-A1 | COMPOSITIONS FOR ENHANCING IRRIGATION EFFICIENCY AND METHODS OF USE THEREOF | Corbet Scientific, LLC (US) | 2025-11-12 | — | — | EP | disclosed |
| US-20250321491-A1 | Compositions For Removing A Photoresist From A Substrate And Uses Thereof | VERSUM MAT US LLC (US) | 2025-10-16 | — | — | US | disclosed |
| US-12325844-B2 | Photoresist remover | VERSUM MATERIALS US, LLC (US) | 2025-06-10 | — | — | US | disclosed |
| WO-2024148163-A1 | COMPOSITIONS FOR ENHANCING IRRIGATION EFFICIENCY AND METHODS OF USE THEREOF | CORBET SCIENTIFIC, LLC (US) | 2024-07-11 | — | — | WO | disclosed |
| EP-4314951-A1 | COMPOSITIONS FOR REMOVING A PHOTORESIST FROM A SUBSTRATE AND USES THEREOF | Versum Materials US, LLC (US) | 2024-02-07 | — | — | EP | disclosed |
| CN-117460996-A | Composition for removing photoresist from substrate and use thereof | 弗萨姆材料美国有限责任公司 | 2024-01-26 | — | — | CN | disclosed |
| CN-109960116-B | Photoresist remover | 弗萨姆材料美国有限责任公司 | 2022-10-04 | — | — | CN | disclosed |
| EP-4038173-A1 | PHOTORESIST REMOVER | Versum Materials US, LLC (US) | 2022-08-10 | — | — | EP | disclosed |
| US-11353794-B2 | Photoresist stripper | VERSUM MATERIALS US, LLC (US) | 2022-06-07 | — | — | US | disclosed |
| CN-114502708-A | Photoresist remover | 弗萨姆材料美国有限责任公司 | 2022-05-13 | — | — | CN | disclosed |
| WO-2021067147-A1 | PHOTORESIST REMOVER | VERSUM MATERIALS US, LLC (US) | 2021-04-08 | — | — | WO | disclosed |
| US-20190196337-A1 | Photoresist Stripper | VERSUM MATERIALS US, LLC (US) | 2019-06-27 | — | — | US | disclosed |
| EP-3502225-A1 | PHOTORESIST STRIPPER | Versum Materials US, LLC (US) | 2019-06-26 | — | — | EP | disclosed |