⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL238092 | 0.88 | — | — | |
| SCHEMBL3080784 | 0.77 | — | — | |
| SCHEMBL4739774 | 0.77 | — | — | |
| SCHEMBL9247348 | 0.76 | — | — | |
| SCHEMBL11327636 | 0.75 | — | — | |
| SCHEMBL182009 | 0.74 | — | — | |
| SCHEMBL5227550 | 0.73 | — | — | |
| SCHEMBL262994 | 0.72 | PYGM (0.35) | — | |
| SCHEMBL3622646 | 0.72 | — | — | |
| SCHEMBL7411108 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 118 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4603516-A1 | PHOTOINITIATOR AND CURABLE COMPOSITION COMPRISING THE SAME | Covestro (Taiwan) Ltd (TW) | 2025-08-20 | — | — | EP | disclosed |
| US-20250236811-A1 | PHOTOINITIATOR AND CURABLE COMPOSITION COMPRISING THE SAME | NATIONAL CENTRAL UNIVERSITY (TW) | 2025-07-24 | — | — | US | disclosed |
| CN-118259542-A | Electroplating-resistant composition and dry film thereof | 太阳油墨（苏州）有限公司 | 2024-06-28 | — | — | CN | disclosed |
| WO-2023219039-A1 | URETHANE (METH)ACRYLATE AND PHOTOCURABLE RESIN COMPOSITION CONTAINING SAME | 日油株式会社 | 2023-11-16 | — | — | WO | disclosed |
| CN-112543891-A | Resin composition for protective agent and use thereof | 株式会社有泽制作所 | 2021-03-23 | — | — | CN | disclosed |
| EP-2554608-B1 | METALLIC PIGMENT COMPOSITION | ASAHI CHEMICAL IND (JP) | 2018-12-26 | — | — | EP | disclosed |
| EP-2565238-B1 | METALLIC-PIGMENT COMPOSITION | ASAHI CHEMICAL IND (JP) | 2017-08-23 | — | — | EP | disclosed |
| EP-2581419-B1 | METALLIC PIGMENT COMPOSITION | ASAHI KASEI CHEMICALS CORP (JP) | 2016-10-05 | — | — | EP | disclosed |
| US-9296906-B2 | Metallic pigment composition | ASAHI KASEI CHEMICALS CORPORATION (JP) | 2016-03-29 | — | — | US | disclosed |
| EP-2963069-A1 | TERTIARY-NITROGEN-ATOM-CONTAINING LACTONE POLYMER HAVING POLYMERIZABLE GROUP, AND METHOD FOR PRODUCING SAME | Daicel Corporation (JP) | 2016-01-06 | — | — | EP | disclosed |
| US-4769485-A | Preparation of alkenoyl isocyanates | NIPPON PAINT CO., LTD. (JP) | 1988-09-06 | — | — | US | disclosed |
| EP-0232545-A2 | Photocurable composition and cured article | Nippon Paint Co., Ltd. (JP) | 1987-08-19 | — | — | EP | disclosed |
| EP-0207621-A2 | Functional polymers and their production | Nippon Paint Co., Ltd. (JP) | 1987-01-07 | — | — | EP | disclosed |
| EP-0206544-A2 | Instantaneously curable composition | Nippon Paint Co., Ltd. (JP) | 1986-12-30 | — | — | EP | disclosed |
| EP-0204497-A1 | Polymerisation process employing compounds having polymerisable acylurethane structures | Nippon Paint Co., Ltd. (JP) | 1986-12-10 | — | — | EP | disclosed |
| EP-0202840-A2 | Isocyanate compounds and their production | Nippon Paint Co., Ltd. (JP) | 1986-11-26 | — | — | EP | disclosed |
| EP-0177122-A2 | Acrylamide derivatives | Nippon Paint Co., Ltd. (JP) | 1986-04-09 | — | — | EP | disclosed |
| EP-0143613-A2 | Production of isocyanate compounds | NIPPON PAINT CO., LTD. (JP) | 1985-06-05 | — | — | EP | disclosed |
| US-4279986-A | Negative resist and radical scavenger composition with capability of preventing post-irradiation polymerization | NIPPON ELECTRIC CO., LTD. (JP) | 1981-07-21 | — | — | US | disclosed |
| US-4164421-A | Photocurable composition containing an o-quinonodiazide for printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 1979-08-14 | — | — | US | disclosed |