⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2106683 | 0.88 | — | — | |
| SCHEMBL3080784 | 0.77 | — | — | |
| SCHEMBL4739774 | 0.77 | — | — | |
| SCHEMBL9247348 | 0.76 | — | — | |
| SCHEMBL11327636 | 0.75 | — | — | |
| SCHEMBL182009 | 0.74 | — | — | |
| SCHEMBL5227550 | 0.73 | — | — | |
| SCHEMBL3622646 | 0.72 | — | — | |
| SCHEMBL262994 | 0.72 | PYGM (0.35) | — | |
| SCHEMBL7411108 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250326945-A1 | INK SET FOR TEXTILE PRINTING, IMAGE FORMING APPARATUS, AND IMAGE FORMING METHOD | KONICA MINOLTA INC (JP) | 2025-10-23 | — | — | US | disclosed |
| CN-114651050-B | Thermosetting inkjet ink and printing method | 柯尼卡美能达株式会社 | 2022-11-29 | — | — | CN | disclosed |
| CN-114651020-A | Thermosetting composition and thermosetting inkjet ink | 柯尼卡美能达株式会社 | 2022-06-21 | — | — | CN | disclosed |
| CN-114651050-A | Thermosetting inkjet ink and printing method | 柯尼卡美能达株式会社 | 2022-06-21 | — | — | CN | disclosed |
| US-20180171078-A1 | METHOD OF MANUFACTURING GRANULAR POLYARYLENE SULFIDE, AND GRANULAR POLYARYLENE SULFIDE | KUREHA CORPORATION (JP) | 2018-06-21 | — | — | US | disclosed |
| US-9745406-B2 | Curable composition | CEMEDINE CO., LTD. (JP) | 2017-08-29 | — | — | US | disclosed |
| EP-2412756-B1 | CURABLE COMPOSITION | CEMEDINE CO LTD (JP) | 2016-12-21 | — | — | EP | disclosed |
| US-20150126680-A1 | PARTICLES FOR ELECTROPHORETIC DISPLAYS | MERCK PATENT GMBH (DE) | 2015-05-07 | — | — | US | disclosed |
| CN-102149747-B | Multibranched polyalkylene glycol polymer and manufacturing method thereof, and cement admixture | NIPPON CATALYTIC CHEM IND | 2015-04-29 | — | — | CN | disclosed |
| WO-2013170932-A1 | PARTICLES FOR ELECTROPHORETIC DISPLAYS | MERCK PATENT GMBH (DE) | 2013-11-21 | — | — | WO | disclosed |
| EP-1467966-B1 | WATER-SOLUBLE DITHIOESTERS AND METHOD FOR POLYMERIZATION THEREOF | LG CHEMICAL LTD (KR) | 2012-07-18 | — | — | EP | disclosed |
| EP-2412756-A1 | CURABLE COMPOSITION | CEMEDINE CO., LTD. (JP) | 2012-02-01 | — | — | EP | disclosed |
| US-20120004371-A1 | CURABLE COMPOSITION | CEMEDINE CO., LTD. (JP) | 2012-01-05 | — | — | US | disclosed |
| US-20090269683-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND COLOR FILTERS | JSR CORPORATION (JP) | 2009-10-29 | — | — | US | disclosed |
| US-6888020-B2 | Water-soluble dithioesters and method for polymerization thereof | LG CHEM, LTD. (KR) | 2005-05-03 | — | — | US | disclosed |
| EP-1467966-A2 | WATER-SOLUBLE DITHIOESTERS AND METHOD FOR POLYMERIZATION THEREOF | LG Chem, Ltd. (KR) | 2004-10-20 | — | — | EP | disclosed |
| US-20040138492-A1 | Water-soluble dithioesters and method for polymerization thereof | LG CHEM, LTD. (KR) | 2004-07-15 | — | — | US | disclosed |
| WO-2003062280-A2 | WATER-SOLUBLE DITHIOESTERS AND METHOD FOR POLYMERIZATION THEREOF | LG CHEM, LTD. (KR) | 2003-07-31 | — | — | WO | disclosed |