SCHEMBL21074231

SCHEMBL21074231

C=C(Cl)C(O)OCC(=O)OCC(F)(F)F

nearest known ligand 0.44

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
HTT P42858 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21074232 0.74 HTT (0.39) HTT
SCHEMBL22827730 0.71 HTT (0.46) HTT
SCHEMBL22889227 0.70 HTT (0.37) HTT
SCHEMBL9937614 0.68 HTT (0.48) HTT
SCHEMBL800122 0.67 TSHR (0.41) HTT
SCHEMBL10175873 0.67 HTT (0.39) HTT
SCHEMBL22064258 0.67 HTT (0.41) HTT
SCHEMBL619831 0.66 HTT (0.46) HTT
SCHEMBL7062833 0.66 HTT (0.52) HTT
SCHEMBL9937439 0.66 HTT (0.46) HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11584810-B2 Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, method of manufacturing electronic device, compound, and resin FUJIFILM CORPORATION (JP) 2023-02-21 US disclosed
US-20190171104-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD OF MANUFACTURING ELECTRONIC DEVICE, COMPOUND, AND RESIN FUJIFILM CORPORATION (JP) 2019-06-06 US disclosed