⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21135763 | 0.83 | NR1H2 (0.33) | — | |
| SCHEMBL21135773 | 0.77 | ALDH1A1 (0.36) | — | |
| SCHEMBL21135986 | 0.75 | ALDH1A1 (0.32) | — | |
| SCHEMBL21135730 | 0.75 | CYP19A1 (0.40) | — | |
| SCHEMBL21135765 | 0.73 | CTSL (0.33) | — | |
| SCHEMBL16732045 | 0.72 | TSHR (0.34) | — | |
| SCHEMBL21135983 | 0.71 | LIPA (0.30) | — | |
| SCHEMBL4403072 | 0.71 | ALDH1A1 (0.44) | — | |
| SCHEMBL18922947 | 0.71 | EPHX1 (0.39) | — | |
| SCHEMBL16732014 | 0.70 | EPHX1 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20190196326-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD OF MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2019-06-27 | — | — | US | disclosed |