⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21135961 | 0.67 | TSHR (0.32) | — | |
| SCHEMBL14780498 | 0.66 | ALOX5 (0.38) | — | |
| SCHEMBL14946655 | 0.63 | — | — | |
| SCHEMBL15521102 | 0.62 | PANK3 (0.34) | — | |
| SCHEMBL21135951 | 0.61 | ALDH1A1 (0.38) | — | |
| SCHEMBL21136015 | 0.60 | GRM2 (0.32) | — | |
| SCHEMBL2995743 | 0.60 | ALOX5 (0.39) | — | |
| SCHEMBL3878004 | 0.59 | ALDH1A1 (0.30) | — | |
| SCHEMBL14780501 | 0.57 | — | — | |
| SCHEMBL21135952 | 0.57 | ALDH1A1 (0.35) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20190196326-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD OF MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2019-06-27 | — | — | US | disclosed |