SCHEMBL21135950

SCHEMBL21135950

CCC(F)(CCCCC(F)(CCOC)S(=O)(=O)O)S(=O)(=O)O

nearest known ligand 0.30

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
LPAR1 Q92633 1/20 0.30
LPAR3 Q9UBY5 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21135955 0.93
SCHEMBL7900379 0.78 CES2 (0.46) LPAR1LPAR3
SCHEMBL29282843 0.74 CES2 (0.48) LPAR1LPAR3
SCHEMBL28631360 0.74 CES2 (0.48) LPAR1LPAR3
SCHEMBL29166638 0.74 CES2 (0.48) LPAR1LPAR3
SCHEMBL31249509 0.74 CES2 (0.48) LPAR1LPAR3
SCHEMBL28621393 0.74 CES2 (0.48) LPAR1LPAR3
SCHEMBL28629893 0.74 CES2 (0.48) LPAR1LPAR3
SCHEMBL29166403 0.74 CES2 (0.48) LPAR1LPAR3
SCHEMBL29166701 0.74 CES2 (0.48) LPAR1LPAR3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20190196326-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD OF MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2019-06-27 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20190196326-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD OF MANUFACTURING ELECTRONIC DEVICE RER1, ACTR5, RAD51 LPAR1 2590/4885LPAR3 3510/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.