SCHEMBL21137385

SCHEMBL21137385

C=Cc1ccc(OC(OC)c2ccc3ccccc3c2)cc1

nearest known ligand 0.42

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
UGT2B7 P16662 1/20 0.42
MEN1 O00255 3/20 0.41
KMT2A Q03164 3/20 0.41
ATM Q13315 1/20 0.41
AOC3 Q16853 2/20 0.40
CYP1A2 P05177 2/20 0.39
CYP2A6 P11509 1/20 0.39
NQO2 P16083 2/20 0.38
SLC6A2 P23975 4/20 0.37
SLC6A4 P31645 4/20 0.37
SLC6A3 Q01959 4/20 0.37
KCNH2 Q12809 4/20 0.37
CYP2D6 P10635 3/20 0.37
CYP3A4 P08684 2/20 0.37
TSHR P16473 1/20 0.35
HIF1A Q16665 1/20 0.35
UTS2R Q9UKP6 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4411103 0.78 UGT2B7 (0.55) UGT2B7MEN1KMT2AATMAOC3
SCHEMBL15503612 0.77 SLC7A5 (0.44) UGT2B7MEN1KMT2AAOC3CYP1A2
SCHEMBL21137383 0.76 NQO2 (0.45) UGT2B7CYP1A2CYP2A6NQO2
SCHEMBL16174482 0.74 AOC3 (0.54) UGT2B7MEN1KMT2AATMAOC3
SCHEMBL16406620 0.73 CYP2A6 (0.50) UGT2B7MEN1KMT2AATMAOC3
SCHEMBL21900880 0.73 IDO1 (0.35) MEN1KMT2ACYP1A2SLC6A2SLC6A4
SCHEMBL3287560 0.72 ALDH1A1 (0.50) CYP3A4TSHR
Anthracene SCHEMBL27823632 0.71 TRPA1 (0.53) CYP1A2CYP2A6NQO2CYP3A4TSHR
SCHEMBL16406569 0.69 CYP2A6 (0.44) UGT2B7MEN1KMT2AATMAOC3
SCHEMBL685582 0.69 ALDH1A1 (0.46) CYP1A2CYP2A6NQO2CYP3A4TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11762127-B2 Antireflective film including a photoresist material containing a polymer compound having an aromatic group, method of producing antireflective film, and eyeglass type display SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-19 US disclosed
US-11762127-B2 Antireflective film including a photoresist material containing a polymer compound having an aromatic group, method of producing antireflective film, and eyeglass type display SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-19 US disclosed
US-20210096285-A1 ANTIREFLECTIVE FILM INCLUDING A PHOTORESIST MATERIAL CONTAINING A POLYMER COMPOUND HAVING AN AROMATIC GROUP, METHOD OF PRODUCING ANTIREFLECTIVE FILM, AND EYEGLASS TYPE DISPLAY SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-04-01 US disclosed
US-20190187342-A1 ANTIREFLECTIVE FILM, METHOD OF PRODUCING ANTIREFLECTIVE FILM, AND EYEGLASS TYPE DISPLAY SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-06-20 US disclosed