Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SPHK1 | Q9NYA1 | 11/20 | 0.45 |
| ▸ | HTR2C | P28335 | 1/20 | 0.41 |
| ▸ | HTR2B | P41595 | 1/20 | 0.41 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.40 |
| ▸ | HRH3 | Q9Y5N1 | 1/20 | 0.40 |
| ▸ | FFAR4 | Q5NUL3 | 1/20 | 0.39 |
| ▸ | SPHK2 | Q9NRA0 | 7/20 | 0.39 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11165604 | 0.81 | SPHK1 (0.61) | SPHK1SPHK2 | |
| SCHEMBL20793673 | 0.81 | SPHK1 (0.45) | SPHK1HTR2CHTR2BKCNH2HRH3 | |
| SCHEMBL11282060 | 0.81 | SPHK1 (0.45) | SPHK1HTR2CHTR2BKCNH2HRH3 | |
| SCHEMBL7650177 | 0.81 | SPHK1 (0.45) | SPHK1HTR2CHTR2BKCNH2HRH3 | |
| SCHEMBL11275021 | 0.81 | SPHK1 (0.45) | SPHK1KCNH2HRH3FFAR4SPHK2 | |
| SCHEMBL9643576 | 0.80 | HAO1 (0.42) | HTR2CHTR2BKCNH2HRH3 | |
| SCHEMBL5678879 | 0.80 | SPHK1 (0.69) | SPHK1HTR2CHRH3SPHK2 | |
| SCHEMBL7651816 | 0.80 | SPHK1 (0.47) | SPHK1FFAR4SPHK2SIGMAR1 | |
| SCHEMBL7652663 | 0.79 | SPHK1 (0.46) | SPHK1FFAR4SPHK2SIGMAR1 | |
| SCHEMBL11285374 | 0.79 | SPHK1 (0.46) | SPHK1FFAR4SPHK2SIGMAR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3106920-B1 | ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, PHOTOMASK, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORP (JP) | 2019-07-10 | — | — | EP | disclosed |