SCHEMBL21152652

SCHEMBL21152652

CCC1C[C@H](C)CCC1C

nearest known ligand 0.31

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7692442 1.00 L3MBTL1 (0.31) L3MBTL1
SCHEMBL16191202 0.86 L3MBTL1 (0.32) L3MBTL1
SCHEMBL6306091 0.81 L3MBTL1 (0.32) L3MBTL1
SCHEMBL20457812 0.80 CA1 (0.37)
SCHEMBL7885918 0.79 L3MBTL1 (0.31) L3MBTL1
SCHEMBL19227357 0.78
SCHEMBL22811147 0.78
SCHEMBL910156 0.77
SCHEMBL24797577 0.77 L3MBTL1 (0.30) L3MBTL1
SCHEMBL21350163 0.77 TRPA1 (0.32) L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3106920-B1 ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, PHOTOMASK, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORP (JP) 2019-07-10 EP disclosed