SCHEMBL21164135

SCHEMBL21164135

CCCN(C)CCNS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)S(=O)(=O)NS(=O)(=O)C(F)(F)F

nearest known ligand 0.41

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13103134 0.94 EPHX1 (0.38) EPHX1
SCHEMBL13102610 0.89 EPHX1 (0.34) EPHX1
SCHEMBL26451839 0.80 EPHX1 (0.59) EPHX1
SCHEMBL15935702 0.80 EPHX1 (0.59) EPHX1
SCHEMBL21164000 0.78 EPHX1 (0.44) EPHX1
SCHEMBL22876809 0.75 EPHX1 (0.40) EPHX1
SCHEMBL14949357 0.73 EPHX1 (0.37) EPHX1
SCHEMBL16328562 0.72 EPHX1 (0.37) EPHX1
SCHEMBL19820342 0.70 EPHX1 (0.34) EPHX1
SCHEMBL20109894 0.69 EPHX1 (0.33) EPHX1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2681623-B1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM FUJIFILM CORP (JP) 2019-07-10 EP disclosed