Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CTSK | P43235 | 9/20 | 0.38 |
| ▸ | CTSL | P07711 | 6/20 | 0.36 |
| ▸ | CTSB | P07858 | 6/20 | 0.36 |
| ▸ | CTSH | P09668 | 5/20 | 0.35 |
| ▸ | IDO1 | P14902 | 1/20 | 0.34 |
| ▸ | EPHX1 | P07099 | 2/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17222368 | 0.98 | CTSK (0.35) | CTSKCTSLCTSBCTSHIDO1 | |
| SCHEMBL11859113 | 0.84 | EPHX1 (0.36) | IDO1EPHX1ALDH1A1NPSR1 | |
| SCHEMBL23494341 | 0.82 | ALDH1A1 (0.35) | EPHX1ALDH1A1NPSR1 | |
| SCHEMBL1309702 | 0.82 | TSHR (0.35) | EPHX1ALDH1A1NPSR1 | |
| SCHEMBL5835238 | 0.81 | CTSK (0.36) | CTSKCTSLCTSBCTSHIDO1 | |
| SCHEMBL15836475 | 0.80 | TSHR (0.35) | IDO1EPHX1ALDH1A1NPSR1 | |
| SCHEMBL15836471 | 0.78 | TSHR (0.36) | EPHX1ALDH1A1NPSR1 | |
| Ethylene Glycol SCHEMBL8664958 | 0.78 | TSHR (0.44) | EPHX1ALDH1A1NPSR1 | |
| SCHEMBL8407107 | 0.76 | ALDH1A1 (0.37) | EPHX1ALDH1A1NPSR1 | |
| SCHEMBL5680226 | 0.76 | TSHR (0.38) | CTSKCTSLCTSBEPHX1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8815490-B2 | Radiation-sensitive resin composition, polymer, and method for forming resist pattern | JSR CORPORATION (JP) | 2014-08-26 | — | — | US | disclosed |
| US-20120094234-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND METHOD FOR FORMING RESIST PATTERN | JSR CORPORATION (JP) | 2012-04-19 | — | — | US | disclosed |