SCHEMBL21183236

SCHEMBL21183236

COCCOCCCN(CCOCOC)CCOCOC

nearest known ligand 0.33

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
BLM P54132 1/20 0.32
PMP22 Q01453 1/20 0.32
HSD17B10 Q99714 1/20 0.32
CA2 P00918 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26147368 0.92 BLM (0.37) BLMPMP22HSD17B10CA2
SCHEMBL10082391 0.92 MEN1 (0.30)
SCHEMBL24996712 0.92 MEN1 (0.30)
SCHEMBL10446249 0.92 BLM (0.37) BLMPMP22HSD17B10CA2
SCHEMBL20465866 0.90 BLM (0.35) BLMPMP22HSD17B10CA2
SCHEMBL19050823 0.87 BLM (0.37) BLMPMP22HSD17B10CA2
SCHEMBL2921308 0.87 CA2 (0.33) BLMPMP22HSD17B10CA2
SCHEMBL22166141 0.87 BLM (0.39) BLMPMP22HSD17B10
SCHEMBL22517121 0.86 BLM (0.33) BLMPMP22HSD17B10CA2
SCHEMBL24178239 0.85 BLM (0.38) BLMPMP22HSD17B10CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3382454-B1 RESIST UNDERLAYER FILM COMPOSITION, PATTERNING PROCESS, AND METHOD FOR FORMING RESIST UNDERLAYER FILM SHINETSU CHEMICAL CO (JP) 2019-07-24 EP disclosed