Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | BLM | P54132 | 1/20 | 0.38 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.38 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.38 |
| ▸ | CA2 | P00918 | 5/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | POLB | P06746 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL24178237 | 0.93 | CA2 (0.38) | BLMPMP22HSD17B10CA2MEN1 | |
| SCHEMBL19050823 | 0.93 | BLM (0.37) | BLMPMP22HSD17B10CA2MEN1 | |
| SCHEMBL26147368 | 0.93 | BLM (0.37) | BLMPMP22HSD17B10CA2MEN1 | |
| SCHEMBL9359934 | 0.92 | BLM (0.42) | BLMPMP22HSD17B10CA2MEN1 | |
| SCHEMBL10498370 | 0.92 | BLM (0.42) | BLMPMP22HSD17B10CA2MEN1 | |
| SCHEMBL61362 | 0.92 | BLM (0.42) | BLMPMP22HSD17B10CA2MEN1 | |
| SCHEMBL9481973 | 0.92 | BLM (0.42) | BLMPMP22HSD17B10CA2MEN1 | |
| SCHEMBL24177721 | 0.92 | BLM (0.42) | BLMPMP22HSD17B10CA2MEN1 | |
| SCHEMBL8953515 | 0.92 | BLM (0.42) | BLMPMP22HSD17B10CA2MEN1 | |
| Bromide SCHEMBL8935205 | 0.90 | BLM (0.41) | BLMPMP22HSD17B10CA2MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230152692-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-18 | — | — | US | disclosed |
| US-20230152692-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-18 | — | — | US | disclosed |
| US-20220004101-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-01-06 | — | — | US | disclosed |