⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL609096 | 1.00 | CA1 (0.33) | — | |
| SCHEMBL607692 | 1.00 | CA1 (0.33) | — | |
| SCHEMBL436662 | 0.97 | — | — | |
| SCHEMBL126941 | 0.91 | — | — | |
| SCHEMBL128481 | 0.84 | — | — | |
| SCHEMBL3942982 | 0.78 | ACHE (0.31) | — | |
| SCHEMBL1475814 | 0.78 | ACHE (0.31) | — | |
| SCHEMBL4030169 | 0.78 | ACHE (0.31) | — | |
| SCHEMBL15227532 | 0.78 | ACHE (0.31) | — | |
| SCHEMBL1475813 | 0.78 | ACHE (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2026 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114516815-A | Controllable defluorination deuteration method for polyfluoroamide | 中国科学技术大学 | 2022-05-20 | — | — | CN | claimed |
| CN-106019830-B | Resist composition and method for producing resist pattern | 住友化学株式会社 | 2021-08-20 | — | — | CN | claimed |
| CN-108368214-B | Novolac resin and resist film | DIC株式会社 | 2021-03-23 | — | — | CN | claimed |
| CN-108008600-B | Radiation-sensitive composition | 三菱瓦斯化学株式会社 | 2021-02-09 | — | — | CN | claimed |
| CN-112180680-A | Radical-cation hybrid photocurable composition and photosensitive dry film resist | 四川乐凯新材料有限公司 | 2021-01-05 | — | — | CN | claimed |
| CN-112147843-A | Cationic photocurable composition and photosensitive dry film resist | 四川乐凯新材料有限公司 | 2020-12-29 | — | — | CN | claimed |
| EP-2955575-B1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND POLYPHENOL DERIVATIVE USED IN SAME | MITSUBISHI GAS CHEMICAL CO (JP) | 2020-07-29 | — | — | EP | claimed |
| CN-104281006-B | Radiation-ray sensitive composition | 三菱瓦斯化学株式会社 | 2019-01-22 | — | — | CN | claimed |
| US-9946157-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-04-17 | — | — | US | claimed |
| US-20160291464-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-10-06 | — | — | US | claimed |
| US-6403288-B1 | COATING WITH COPOLYMER COMPRISING HYDROXYSTYRENE DERIVATIVE MONOMER HAVING ACID DISSOCIABLE GROUP; EXPOSURE TO RADIATION; DEVELOPMENT | JSR CORPORATION (JP) | 2002-06-11 | — | — | US | claimed |
| US-6369279-B1 | STYRENE WITH ETHER OR FLUORINE GROUPS FOR POLYMERS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-04-09 | — | — | US | claimed |
| US-6210856-B1 | Resist composition and process of forming a patterned resist layer on a substrate | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2001-04-03 | — | — | US | claimed |
| US-6103447-A | Approach to formulating irradiation sensitive positive resists | INTERNATIONAL BUSINESS MACHINES CORP. (US) | 2000-08-15 | — | — | US | claimed |
| US-5856561-A | Bisphenol carboxylic acid tertiary ester derivatives and chemically amplified positive resist compositions | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-01-05 | — | — | US | claimed |
| US-4749761-A | FOR CONTACT LENSES-CROSSLINKED COPOLYMER OF N-VINYL-2-PYRROLIDONE AND ACRYLIC ESTER | SMITH & NEPHEW ASSOCIATED COMPANIES P.L.C. (GB) | 1988-06-07 | — | — | US | claimed |
| EP-0039060-B1 | A NEW METHOD FOR PREPARATION OF ANTHRACYCLINE DERIVATIVES | Zaidanhojin Biseibutsu Kagaku Kenkyukai (JP) | 1986-08-06 | — | — | EP | claimed |
| US-4360664-A | ANTITUMOR AGENT, ANTIBIOTIC | ZAIDAN HOJIN BISEIBUTSU KAGAKU KENKYU KAI (JP) | 1982-11-23 | — | — | US | claimed |
| US-4303785-A | ETHERS OF ADRIAMYCIN AND DAUNORUBICIN | ZAIDAN HOJIN BISEIBUTSU KAGAKU KENKYU KAI (JP) | 1981-12-01 | — | — | US | claimed |
| EP-0039060-A1 | A new method for preparation of anthracycline derivatives | Zaidanhojin Biseibutsu Kagaku Kenkyukai (JP) | 1981-11-04 | — | — | EP | claimed |