Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 1/20 | 0.52 |
| ▸ | CA9 | Q16790 | 1/20 | 0.52 |
| ▸ | LMNA | P02545 | 2/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.39 |
| ▸ | TP53 | P04637 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methacrylic Acid SCHEMBL29728225 | 0.94 | CA1 (0.61) | CA1CA9LMNAALDH1A1TP53 | |
| Methacrylic Acid SCHEMBL5815522 | 0.92 | CA1 (0.59) | CA1CA9LMNAALDH1A1TP53 | |
| Methacrylic Acid SCHEMBL36254 | 0.92 | CA1 (0.59) | CA1CA9LMNAALDH1A1TP53 | |
| Methacrylic Acid SCHEMBL326715 | 0.92 | CA1 (0.59) | CA1CA9LMNAALDH1A1TP53 | |
| Methacrylic Acid SCHEMBL4068636 | 0.91 | CA1 (0.57) | CA1CA9LMNAALDH1A1TP53 | |
| Butyrolactone SCHEMBL10999881 | 0.87 | CA1 (0.61) | CA1CA9LMNAALDH1A1TP53 | |
| Methacrylic Acid SCHEMBL1415156 | 0.87 | LMNA (0.52) | CA1CA9LMNAALDH1A1TP53 | |
| Methacrylic Acid SCHEMBL28002670 | 0.86 | CA1 (0.52) | CA1CA9LMNAALDH1A1TP53 | |
| Methacrylic Acid SCHEMBL15496 | 0.86 | CA1 (0.52) | CA1CA9LMNAALDH1A1TP53 | |
| Butyrolactone SCHEMBL7650673 | 0.85 | CA1 (0.64) | CA1CA9LMNAALDH1A1TP53 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 929 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-120137111-A | Composition for 3D ink-jet printing and preparation method and application thereof | 珠海赛纳三维科技有限公司 | 2025-06-13 | — | — | CN | claimed |
| CN-119798525-A | Resin for immersion photoresist, preparation method and immersion photoresist | 宁波南大光电材料有限公司 | 2025-04-11 | — | — | CN | claimed |
| CN-119798524-A | Resin for immersion type ArF photoresist, preparation method and immersion type ArF photoresist | 宁波南大光电材料有限公司 | 2025-04-11 | — | — | CN | claimed |
| CN-116162186-B | Acid generator based on polystyrene sulfonium salt and photoresist composition thereof | 中国科学院理化技术研究所 | 2025-04-11 | — | — | CN | claimed |
| CN-115542665-B | Positive chemical amplification type photoresist and application method thereof | 徐州博康信息化学品有限公司 | 2025-03-07 | — | — | CN | claimed |
| CN-119264321-A | Method for regulating and controlling molecular weight change of electronic grade acrylic resin | 厦门大学 | 2025-01-07 | — | — | CN | claimed |
| CN-118165261-A | Preparation method of high-viscosity photoresist resin | 明士新材料有限公司 | 2024-06-11 | — | — | CN | claimed |
| CN-117304413-A | Composition for three-dimensional printing of biocompatible object, printing method and device | 珠海赛纳三维科技有限公司 | 2023-12-29 | — | — | CN | claimed |
| CN-116162186-A | Acid generator based on polystyrene sulfonium salt and photoresist composition thereof | 中国科学院理化技术研究所 | 2023-05-26 | — | — | CN | claimed |
| CN-116003702-A | 3D printing resin and application | 深圳市纵维立方科技有限公司 | 2023-04-25 | — | — | CN | claimed |
| CN-102627887-A | Photopolymerizable inkjet black ink, and ink cartridge, inkjet printer and printed material using the ink, and method of preparing the ink | RICOH KK | 2012-08-08 | — | — | CN | claimed |
| US-20120147103-A1 | ULTRAVIOLET CROSSLINKING INKJET INK, INK CARTRIDGE CONTAINING SAME, AND IMAGE FORMING METHOD AND APPARATUS USING SAME | RICOH COMPANY, LTD. (JP) | 2012-06-14 | — | — | US | claimed |
| US-20120103935-A1 | METHOD FOR IMPROVING SELF-ASSEMBLED POLYMER FEATURES | JSR CORPORATION (JP) | 2012-05-03 | — | — | US | claimed |
| EP-1664927-B1 | LOW-POLYDISPERSITY PHOTOIMAGEABLE ACRYLIC POLYMERS, PHOTORESISTS AND PROCESSES FOR MICROLITHOGRAPHY | COMMW SCIENT IND RES ORG (AU) | 2011-04-06 | — | — | EP | claimed |
| US-20090214823-A1 | METHODS FOR ALIGNING POLYMER FILMS AND RELATED STRUCTURES | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-08-27 | — | — | US | claimed |
| EP-1766474-A2 | PHOTOACTIVE COMPOUNDS | AZ Electronic Materials USA Corp. (US) | 2007-03-28 | — | — | EP | claimed |
| WO-2005121894-A2 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONICS MATERIALS USA CORP. (DE) | 2005-12-22 | — | — | WO | claimed |
| US-20050271974-A1 | Photoactive compounds | AZ ELECTRONIC MATERIALS USA CORP. | 2005-12-08 | — | — | US | claimed |
| US-6902859-B2 | Chemically amplified resist composition and method for forming patterned film using same | FUJITSU LIMITED (JP) | 2005-06-07 | — | — | US | claimed |
| US-20020150834-A1 | Chemically amplified resist composition and method for forming patterned film using same | FUJITSU LIMITED (JP) | 2002-10-17 | — | — | US | claimed |