Iodide

Iodide

SCHEMBL21245472

CN(C)CCCN(C)C.[I-].[I-].[Ni+2]

nearest known ligand 0.64

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ACHECHRM1CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNG

The experimentally established mechanism targets of Iodide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.64
TSHR P16473 1/20 0.64
DNM1 Q05193 3/20 0.50
TDP1 Q9NUW8 3/20 0.44
CA12 O43570 1/20 0.44
CA2 P00918 1/20 0.44
CA3 P07451 1/20 0.44
CA4 P22748 1/20 0.44
CA6 P23280 1/20 0.44
CA5A P35218 1/20 0.44
CA7 P43166 1/20 0.44
CA9 Q16790 1/20 0.44
CA14 Q9ULX7 1/20 0.44
CA5B Q9Y2D0 1/20 0.44
MAPT P10636 1/20 0.41
PRMT3 O60678 1/20 0.37
CARM1 Q86X55 1/20 0.37
PRMT6 Q96LA8 1/20 0.37
PRMT1 Q99873 1/20 0.37
PRMT8 Q9NR22 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL21245510 0.92 ALDH1A1 (0.64) ALDH1A1TSHRDNM1TDP1CA12
SCHEMBL1290871 0.91 ALDH1A1 (0.75) ALDH1A1TSHRDNM1TDP1CA12
SCHEMBL212626 0.91
Bromide SCHEMBL30558707 0.87 ALDH1A1 (0.69) ALDH1A1TSHRDNM1TDP1CA12
SCHEMBL10790523 0.87 ALDH1A1 (0.83) ALDH1A1TSHRDNM1TDP1CA12
SCHEMBL26135085 0.87 ALDH1A1 (0.69) ALDH1A1TSHRDNM1TDP1CA12
Ammonia Solution, Strong SCHEMBL17238883 0.87 ALDH1A1 (0.69) ALDH1A1TSHRDNM1TDP1CA12
Hydrochloric Acid SCHEMBL21245483 0.83 ALDH1A1 (0.64) ALDH1A1TSHRDNM1TDP1CA12
Hydrochloric Acid SCHEMBL21245487 0.83 ALDH1A1 (0.64) ALDH1A1TSHRDNM1TDP1CA12
Hydrochloric Acid SCHEMBL8314517 0.83 ALDH1A1 (0.64) ALDH1A1TSHRDNM1TDP1CA12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11959171-B2 Methods of forming a transition metal containing film on a substrate by a cyclical deposition process ASM IP HOLDING B.V. (NL) 2024-04-16 US disclosed
US-11952658-B2 Cyclic deposition methods for forming metal-containing material and films and structures including the metal-containing material ASM IP HOLDING B.V. (NL) 2024-04-09 US disclosed
US-11814715-B2 Cyclic deposition methods for forming metal-containing material and films and structures including the metal-containing material ASM IP HOLDING B.V. (NL) 2023-11-14 US disclosed
CN-115928047-A vapor deposition process ASM IP私人控股有限公司 2023-04-07 CN disclosed
US-20230067660-A1 CYCLIC DEPOSITION METHODS FOR FORMING METAL-CONTAINING MATERIAL AND FILMS AND STRUCTURES INCLUDING THE METAL-CONTAINING MATERIAL ASM IP HOLDING B.V. (NL) 2023-03-02 US disclosed
US-20230064120-A1 Vapor Deposition Processes ASM IP HOLDING B.V. (NL) 2023-03-02 US disclosed
US-20220411931-A1 METHODS OF FORMING A TRANSITION METAL CONTAINING FILM ON A SUBSTRATE BY A CYCLICAL DEPOSITION PROCESS ASM IP HOLDING B.V. (NL) 2022-12-29 US disclosed
US-20220389583-A1 CYCLIC DEPOSITION METHODS FOR FORMING METAL-CONTAINING MATERIAL AND FILMS AND STRUCTURES INCLUDING THE METAL-CONTAINING MATERIAL ASM IP HOLDING B.V. (NL) 2022-12-08 US disclosed
CN-114927418-A Selective deposition of transition metal-containing materials ASM IP私人控股有限公司 2022-08-19 CN disclosed
CN-114921767-A Deposition of transition metal-containing materials ASM IP私人控股有限公司 2022-08-19 CN disclosed
US-20210317576-A1 CYCLIC DEPOSITION METHODS FOR FORMING METAL-CONTAINING MATERIAL AND FILMS AND STRUCTURES INCLUDING THE METAL-CONTAINING MATERIAL ASM IP HOLDING B.V. (NL) 2021-10-14 US disclosed
CN-112292477-A Cyclic deposition methods for forming metal-containing materials and films and structures containing metal-containing materials ASM IP私人控股有限公司 2021-01-29 CN disclosed
CN-112292478-A Cyclic deposition methods for forming metal-containing materials and films and structures containing metal-containing materials ASM IP私人控股有限公司 2021-01-29 CN disclosed
US-20200340113-A1 METHOD OF FORMING A TRANSITION METAL CONTAINING FILM ON A SUBSTRATE BY A CYCLICAL DEPOSITION PROCESS, A METHOD FOR SUPPLYING A TRANSITION METAL HALIDE COMPOUND TO A REACTION CHAMBER, AND RELATED VAPOR DEPOSITION APPARATUS ASM IP HOLDING B.V. (NL) 2020-10-29 US disclosed
CN-111684105-A Method for forming a film containing a transition metal on a substrate by a cyclic deposition process, method for supplying a transition metal halide compound to a reaction chamber and related vapor deposition apparatus ASM IP私人控股有限公司 2020-09-18 CN disclosed
US-10731249-B2 Method of forming a transition metal containing film on a substrate by a cyclical deposition process, a method for supplying a transition metal halide compound to a reaction chamber, and related vapor deposition apparatus ASM IP HOLDING B.V. (NL) 2020-08-04 US disclosed
US-20200232096-A1 METHODS OF FORMING A TRANSITION METAL CONTAINING FILM ON A SUBSTRATE BY A CYCLICAL DEPOSITION PROCESS ASM IP HOLDING B.V. (NL) 2020-07-23 US disclosed
WO-2020003000-A1 CYCLIC DEPOSITION METHODS FOR FORMING METAL-CONTAINING MATERIAL AND FILMS AND STRUCTURES INCLUDING THE METAL-CONTAINING MATERIAL ASM IP HOLDING B.V. (NL) 2020-01-02 WO disclosed
WO-2020002995-A1 CYCLIC DEPOSITION METHODS FOR FORMING METAL-CONTAINING MATERIAL AND FILMS AND STRUCTURES INCLUDING THE METAL-CONTAINING MATERIAL ASM IP HOLDING B.V. (NL) 2020-01-02 WO disclosed
US-20190249300-A1 METHOD OF FORMING A TRANSITION METAL CONTAINING FILM ON A SUBSTRATE BY A CYCLICAL DEPOSITION PROCESS, A METHOD FOR SUPPLYING A TRANSITION METAL HALIDE COMPOUND TO A REACTION CHAMBER, AND RELATED VAPOR DEPOSITION APPARATUS ASM IP HOLDING B.V. (NL) 2019-08-15 US disclosed