⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28449274 | 0.89 | — | — | |
| SCHEMBL21248498 | 0.84 | — | — | |
| SCHEMBL4014819 | 0.81 | ALDH1A1 (0.32) | — | |
| SCHEMBL21247813 | 0.81 | — | — | |
| SCHEMBL4455565 | 0.80 | — | — | |
| SCHEMBL28424708 | 0.80 | — | — | |
| SCHEMBL797700 | 0.80 | — | — | |
| SCHEMBL796908 | 0.79 | — | — | |
| SCHEMBL21248508 | 0.77 | — | — | |
| SCHEMBL6857364 | 0.77 | TP53 (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11485749-B2 | Group 4 metal element-containing compounds, method of preparing the same, precursor compositions including the same for forming a film, and method of forming a film using the same | UP CHEMICAL CO., LTD. (KR) | 2022-11-01 | — | — | US | disclosed |
| US-20200361969-A1 | GROUP 4 METAL ELEMENT-CONTAINING COMPOUNDS, METHOD OF PREPARING THE SAME, PRECURSOR COMPOSITIONS INCLUDING THE SAME FOR FORMING A FILM, AND METHOD OF FORMING A FILM USING THE SAME | UP CHEMICAL CO., LTD. (KR) | 2020-11-19 | — | — | US | disclosed |
| CN-111683953-A | Group iv metal element-containing compound, method for producing same, precursor composition for film formation containing same, and method for film formation using same | UP化学株式会社 | 2020-09-18 | — | — | CN | disclosed |
| WO-2019156451-A1 | GROUP IV METAL ELEMENT-CONTAINING COMPOUND, PREPARATION METHOD THEREFOR, PRECURSOR COMPOSITION COMPRISING SAME COMPOUND FOR FILM FORMATION, AND FILM FORMING METHOD USING SAME COMPOSITION | 주식회사 유피케미칼 | 2019-08-15 | — | — | WO | disclosed |