SCHEMBL797700

SCHEMBL797700

CCCCC1=C([Zr](Cl)(Cl)C2=C(CCCC)C=CC2)CC=C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6850741 0.95 PTGS2 (0.32)
SCHEMBL6856823 0.93 PTGS2 (0.34)
SCHEMBL6856934 0.89
SCHEMBL4014819 0.83 ALDH1A1 (0.32)
SCHEMBL4455565 0.81
SCHEMBL28424708 0.81
SCHEMBL6851049 0.80
SCHEMBL796908 0.80
SCHEMBL21247784 0.80
SCHEMBL21248508 0.79

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 48 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7199073-B2 Resins that yield low haze films and the process for their production CHEVRON PHILLIPS CHEMICAL COMPANY, LP (US) 2007-04-03 US claimed
US-20060100401-A1 Resins that yield low haze films and the process for their production CHEVRON PHILLIPS CHEMICAL COMPANY, L.P. 2006-05-11 US claimed
US-6972271-B2 Supported catalyst systems HONEYWELL INTERNATIONAL INC. (US) 2005-12-06 US claimed
US-20050107246-A1 Supported catalyst systems HONEYWELL INTERNATIONAL, INC. (US) 2005-05-19 US claimed
US-6893995-B2 Supported catalyst systems HONEYWELL INTERNATIONAL INC. (US) 2005-05-17 US claimed
EP-1301277-A2 SUPPORTED CATALYST SYSTEMS Honeywell International Inc. (US) 2003-04-16 EP claimed
US-20020123423-A1 Supported catalyst systems HONEYWELL INTERNATIONAL INC. 2002-09-05 US claimed
WO-2002005957-A2 SUPPORTED CATALYST SYSTEMS HONEYWELL INTERNATIONAL INC. (US) 2002-01-24 WO claimed
EP-3893054-B1 PATTERN FORMING METHOD, PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, LAMINATE, AND DEVICE FUJIFILM CORP (JP) 2026-05-06 EP disclosed
US-12393116-B2 Pattern forming method, photosensitive resin composition, cured film, laminate, and device FUJIFILM CORPORATION (JP) 2025-08-19 US disclosed
EP-3893053-B1 PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, CURED FILM, MULTILAYER BODY AND DEVICE FUJIFILM CORP (JP) 2025-01-22 EP disclosed
US-12078929-B2 Photosensitive resin composition, pattern forming method, cured film, laminate, and device FUJIFILM CORPORATION (JP) 2024-09-03 US disclosed
CN-114402256-A Organic film, method for producing same, composition, laminate, and semiconductor device 富士胶片株式会社 2022-04-26 CN disclosed
EP-3893053-A1 PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, CURED FILM, MULTILAYER BODY AND DEVICE FUJIFILM Corporation (JP) 2021-10-13 EP disclosed
US-20020123423-A1 Supported catalyst systems HONEYWELL INTERNATIONAL INC. 2002-09-05 US disclosed
EP-1209171-A1 PROCESS FOR PRODUCING OLEFIN LIVING POLYMER JAPAN as Represented by DIRECTOR GENERAL OF AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2002-05-29 EP disclosed
WO-2002005957-A2 SUPPORTED CATALYST SYSTEMS HONEYWELL INTERNATIONAL INC. (US) 2002-01-24 WO disclosed
US-6239059-B1 PARTICLES HAVING BEEN MODIFIED IN ORDER TO CARRY, ON THE SURFACE, ALUMINIUM AND/OR MAGNESIUM LEWIS-ACID SITES ELF ATOCHEM, S.A. (FR) 2001-05-29 US disclosed
US-6121377-A NATURALLY COMPATIBILIZED POLYOLEFIN BLEND USING A ?ONE-POT? POLYMERIZATION OF AN ALPHA-OLEFIN TO PRODUCE TWO HOMOPOLYMERS OF DIFFERENT STEREOISOMERS (STEREO-REGULAR AND -IRREGULAR) AND A THIRD BLOCK COPOLYMER HAVING ALTERNATING STEREOISOMERS ACADEMY OF APPLIED SCIENCE (US) 2000-09-19 US disclosed
EP-0906920-A1 Activator solid support for metallocene catalysts in the polymerisation of olefins, its corresponding preparation process, catalytical system and polymerisation process ELF ATOCHEM S.A. (FR) 1999-04-07 EP disclosed